JPS56161641A - Exposure apparatus to electron beam - Google Patents

Exposure apparatus to electron beam

Info

Publication number
JPS56161641A
JPS56161641A JP6481880A JP6481880A JPS56161641A JP S56161641 A JPS56161641 A JP S56161641A JP 6481880 A JP6481880 A JP 6481880A JP 6481880 A JP6481880 A JP 6481880A JP S56161641 A JPS56161641 A JP S56161641A
Authority
JP
Japan
Prior art keywords
sample current
value
blanking
deltai
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6481880A
Other languages
English (en)
Japanese (ja)
Other versions
JPH027173B2 (enrdf_load_stackoverflow
Inventor
Akio Ito
Seigo Igaki
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6481880A priority Critical patent/JPS56161641A/ja
Publication of JPS56161641A publication Critical patent/JPS56161641A/ja
Publication of JPH027173B2 publication Critical patent/JPH027173B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP6481880A 1980-05-16 1980-05-16 Exposure apparatus to electron beam Granted JPS56161641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6481880A JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6481880A JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Publications (2)

Publication Number Publication Date
JPS56161641A true JPS56161641A (en) 1981-12-12
JPH027173B2 JPH027173B2 (enrdf_load_stackoverflow) 1990-02-15

Family

ID=13269203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6481880A Granted JPS56161641A (en) 1980-05-16 1980-05-16 Exposure apparatus to electron beam

Country Status (1)

Country Link
JP (1) JPS56161641A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145122A (ja) * 1982-02-23 1983-08-29 Jeol Ltd 電子ビ−ム露光装置
JPS6124231A (ja) * 1984-07-13 1986-02-01 Hitachi Ltd 電子線描画装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632655A (en) * 1979-08-24 1981-04-02 Toshiba Corp Electron beam device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5632655A (en) * 1979-08-24 1981-04-02 Toshiba Corp Electron beam device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145122A (ja) * 1982-02-23 1983-08-29 Jeol Ltd 電子ビ−ム露光装置
JPS6124231A (ja) * 1984-07-13 1986-02-01 Hitachi Ltd 電子線描画装置

Also Published As

Publication number Publication date
JPH027173B2 (enrdf_load_stackoverflow) 1990-02-15

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