JPS56160036A - Pattern defect detecting device - Google Patents

Pattern defect detecting device

Info

Publication number
JPS56160036A
JPS56160036A JP6364380A JP6364380A JPS56160036A JP S56160036 A JPS56160036 A JP S56160036A JP 6364380 A JP6364380 A JP 6364380A JP 6364380 A JP6364380 A JP 6364380A JP S56160036 A JPS56160036 A JP S56160036A
Authority
JP
Japan
Prior art keywords
pattern
detected
values
defect
difference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6364380A
Other languages
Japanese (ja)
Other versions
JPS605220B2 (en
Inventor
Yasushi Wada
Norio Kuji
Toshio Kondo
Takatoshi Nakajima
Tsunetaka Sudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6364380A priority Critical patent/JPS605220B2/en
Publication of JPS56160036A publication Critical patent/JPS56160036A/en
Publication of JPS605220B2 publication Critical patent/JPS605220B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To shorten the inspecting time of pattern defect by a method wherein digital picture signals of the pattern to be detected obtained by photographing process of the pattern to be inspected are compared with numeral values preliminary set in a computer to detect the detect. CONSTITUTION:The pattern 1 to be detected is photographed with a photographing means 2 to obtain an analog picture signal of the pattern to be detected, and it is converted into the digital picture signals by a converter 3. The signals thereof are inputted to an analyzing device 5 of the pattern to be detected through a write circuit 4 being controlled by the host computer 6. Data of picture element values corresponding thus obtained input are stored in a memory, a difference data map of the picture element values is obtained from the difference between the stored data and the preliminary set values, moreover and error flag map is obtained by comparing this difference values of picture elements with the exposed values, and defect can be detected in accordance with thus obtained result. Accordingly because defect can be judged by definite regularity of the pattern to be detected, the inspecting time is shortened.
JP6364380A 1980-05-14 1980-05-14 Pattern defect detection method Expired JPS605220B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6364380A JPS605220B2 (en) 1980-05-14 1980-05-14 Pattern defect detection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6364380A JPS605220B2 (en) 1980-05-14 1980-05-14 Pattern defect detection method

Publications (2)

Publication Number Publication Date
JPS56160036A true JPS56160036A (en) 1981-12-09
JPS605220B2 JPS605220B2 (en) 1985-02-08

Family

ID=13235234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6364380A Expired JPS605220B2 (en) 1980-05-14 1980-05-14 Pattern defect detection method

Country Status (1)

Country Link
JP (1) JPS605220B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63227344A (en) * 1987-03-17 1988-09-21 Toyo Ink Mfg Co Ltd Image detector

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63117205U (en) * 1987-01-23 1988-07-28

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63227344A (en) * 1987-03-17 1988-09-21 Toyo Ink Mfg Co Ltd Image detector

Also Published As

Publication number Publication date
JPS605220B2 (en) 1985-02-08

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