JPS56156763A - Finely working method and apparatus by plasma sputtering - Google Patents
Finely working method and apparatus by plasma sputteringInfo
- Publication number
- JPS56156763A JPS56156763A JP5788980A JP5788980A JPS56156763A JP S56156763 A JPS56156763 A JP S56156763A JP 5788980 A JP5788980 A JP 5788980A JP 5788980 A JP5788980 A JP 5788980A JP S56156763 A JPS56156763 A JP S56156763A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cathode
- anode
- electric
- finely
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5788980A JPS56156763A (en) | 1980-05-02 | 1980-05-02 | Finely working method and apparatus by plasma sputtering |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5788980A JPS56156763A (en) | 1980-05-02 | 1980-05-02 | Finely working method and apparatus by plasma sputtering |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56156763A true JPS56156763A (en) | 1981-12-03 |
Family
ID=13068548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5788980A Pending JPS56156763A (en) | 1980-05-02 | 1980-05-02 | Finely working method and apparatus by plasma sputtering |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56156763A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59139627A (ja) * | 1983-01-31 | 1984-08-10 | Hitachi Ltd | ドライエツチング装置 |
JPS63109181A (ja) * | 1986-10-23 | 1988-05-13 | Anelva Corp | テ−パ−エツチング方法とその装置 |
JPS6428921A (en) * | 1987-07-24 | 1989-01-31 | Tokuda Seisakusho | Plasma treatment device |
US5357073A (en) * | 1992-03-09 | 1994-10-18 | Nippondenso Co., Ltd. | Electrical discharge machine |
CN108698070A (zh) * | 2016-12-29 | 2018-10-23 | 深圳市柔宇科技有限公司 | 光阻涂布工艺与载料装置 |
-
1980
- 1980-05-02 JP JP5788980A patent/JPS56156763A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59139627A (ja) * | 1983-01-31 | 1984-08-10 | Hitachi Ltd | ドライエツチング装置 |
JPS63109181A (ja) * | 1986-10-23 | 1988-05-13 | Anelva Corp | テ−パ−エツチング方法とその装置 |
JPS6428921A (en) * | 1987-07-24 | 1989-01-31 | Tokuda Seisakusho | Plasma treatment device |
US5357073A (en) * | 1992-03-09 | 1994-10-18 | Nippondenso Co., Ltd. | Electrical discharge machine |
CN108698070A (zh) * | 2016-12-29 | 2018-10-23 | 深圳市柔宇科技有限公司 | 光阻涂布工艺与载料装置 |
CN108698070B (zh) * | 2016-12-29 | 2021-09-24 | 深圳市柔宇科技股份有限公司 | 光阻涂布工艺与载料装置 |
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