TW350967B - Device for coating of a substrate - Google Patents

Device for coating of a substrate

Info

Publication number
TW350967B
TW350967B TW085109947A TW85109947A TW350967B TW 350967 B TW350967 B TW 350967B TW 085109947 A TW085109947 A TW 085109947A TW 85109947 A TW85109947 A TW 85109947A TW 350967 B TW350967 B TW 350967B
Authority
TW
Taiwan
Prior art keywords
divisions
connection
substrate
cathodes
cathode
Prior art date
Application number
TW085109947A
Other languages
Chinese (zh)
Inventor
Joachim Dr Szczyrbowski
Gotz Teschner
Anton Zmelty
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Application granted granted Critical
Publication of TW350967B publication Critical patent/TW350967B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering
    • H01J37/3408Planar magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/0203Protection arrangements
    • H01J2237/0206Extinguishing, preventing or controlling unwanted discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A sort of device for coating of a substrate (2), in particular, a non-conductive layer having conductive target in activated atmosphere (such as oxidized atmosphere), including the device an AC power supply (15) with 2 cathodes (11, 12) containing magnets in connection, for common use of the cathode and the target, which is atomized by the target splash, leading to particles settled on the substrate (2), where one of the AC (15) goes in connection through the power supply wiring (13, 14) for connection to one cathode (11) and the other connected to another cathode (12), being each of the cathodes within the division (4, 8) and the divisions (32^, 40) forming the vacuum chamber (3) before going through a path (9) for connection with a part of the divisions (4, 8), where 2 divisions (4, 8) of two cathodes (11, 12) going to connect and for division by one or more divisions (5, 6, 7).
TW085109947A 1995-10-27 1996-08-15 Device for coating of a substrate TW350967B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19540053A DE19540053A1 (en) 1995-10-27 1995-10-27 Substrate coating device for application of non-conductive layers using magnetron sputtering

Publications (1)

Publication Number Publication Date
TW350967B true TW350967B (en) 1999-01-21

Family

ID=7775951

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085109947A TW350967B (en) 1995-10-27 1996-08-15 Device for coating of a substrate

Country Status (2)

Country Link
DE (1) DE19540053A1 (en)
TW (1) TW350967B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19733940C2 (en) * 1997-08-06 2001-03-01 Leybold Systems Gmbh Device for coating plate-shaped substrates with thin layers by means of cathode sputtering
DE19834592A1 (en) * 1998-07-31 2000-02-03 Leybold Systems Gmbh Device for coating plate-shaped substrates
DE102005001334C5 (en) * 2005-01-11 2011-07-14 VON ARDENNE Anlagentechnik GmbH, 01324 Compartment system of a longitudinal vacuum coating system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58120860A (en) * 1982-01-06 1983-07-18 株式会社山東鉄工所 Low temperature plasma treating apparatus of sheet-like substance
US4608943A (en) * 1984-10-24 1986-09-02 Sovonics Solar Systems Cathode assembly with localized profiling capabilities
US4920917A (en) * 1987-03-18 1990-05-01 Teijin Limited Reactor for depositing a layer on a moving substrate
DE3912295C2 (en) * 1989-04-14 1997-05-28 Leybold Ag Cathode sputtering system
DE4324683C1 (en) * 1993-07-22 1994-11-17 Fraunhofer Ges Forschung Procedure for adapting the generator in bipolar low-pressure glow processes
DE4333825C1 (en) * 1993-09-28 1995-02-23 Mat Gmbh Apparatus for coating elongated flexible products

Also Published As

Publication number Publication date
DE19540053A1 (en) 1997-04-30

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