JPS56146667A - Mirror surface grinder - Google Patents
Mirror surface grinderInfo
- Publication number
- JPS56146667A JPS56146667A JP5038080A JP5038080A JPS56146667A JP S56146667 A JPS56146667 A JP S56146667A JP 5038080 A JP5038080 A JP 5038080A JP 5038080 A JP5038080 A JP 5038080A JP S56146667 A JPS56146667 A JP S56146667A
- Authority
- JP
- Japan
- Prior art keywords
- binder
- holding pad
- grinding
- grooves
- mirror surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011230 binding agent Substances 0.000 abstract 5
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5038080A JPS56146667A (en) | 1980-04-18 | 1980-04-18 | Mirror surface grinder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5038080A JPS56146667A (en) | 1980-04-18 | 1980-04-18 | Mirror surface grinder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56146667A true JPS56146667A (en) | 1981-11-14 |
JPS6365473B2 JPS6365473B2 (enrdf_load_stackoverflow) | 1988-12-15 |
Family
ID=12857261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5038080A Granted JPS56146667A (en) | 1980-04-18 | 1980-04-18 | Mirror surface grinder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56146667A (enrdf_load_stackoverflow) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5959347A (ja) * | 1982-09-23 | 1984-04-05 | ウイリアム・デイ−・ブデインガ− | 研磨操作のための工作物ホルダ |
JPS60118467A (ja) * | 1983-11-30 | 1985-06-25 | Fujimi Kenmazai Kogyo Kk | 半導体ウエハ−の取付方法 |
JPH0679618A (ja) * | 1991-12-20 | 1994-03-22 | Cybeq Syst Inc | 研磨ヘッド、エッジリテイナの使用方法及びこのエッジリテイナを使用するための装置 |
US5876273A (en) * | 1996-04-01 | 1999-03-02 | Kabushiki Kaisha Toshiba | Apparatus for polishing a wafer |
US6231428B1 (en) | 1999-03-03 | 2001-05-15 | Mitsubishi Materials Corporation | Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring |
US6368189B1 (en) | 1999-03-03 | 2002-04-09 | Mitsubishi Materials Corporation | Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
JP2009255292A (ja) * | 1994-03-02 | 2009-11-05 | Applied Materials Inc | キャリアヘッド及び基板の化学機械研磨のためのシステム |
JP2011201015A (ja) * | 1995-10-09 | 2011-10-13 | Ebara Corp | ポリッシング装置及び方法 |
CN103419122A (zh) * | 2013-08-13 | 2013-12-04 | 国家电网公司 | 一种镜板研磨平台 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5458294A (en) * | 1977-10-19 | 1979-05-10 | Hitachi Ltd | Waxless polishing device |
-
1980
- 1980-04-18 JP JP5038080A patent/JPS56146667A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5458294A (en) * | 1977-10-19 | 1979-05-10 | Hitachi Ltd | Waxless polishing device |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5959347A (ja) * | 1982-09-23 | 1984-04-05 | ウイリアム・デイ−・ブデインガ− | 研磨操作のための工作物ホルダ |
JPS60118467A (ja) * | 1983-11-30 | 1985-06-25 | Fujimi Kenmazai Kogyo Kk | 半導体ウエハ−の取付方法 |
JPH0679618A (ja) * | 1991-12-20 | 1994-03-22 | Cybeq Syst Inc | 研磨ヘッド、エッジリテイナの使用方法及びこのエッジリテイナを使用するための装置 |
JP2009255292A (ja) * | 1994-03-02 | 2009-11-05 | Applied Materials Inc | キャリアヘッド及び基板の化学機械研磨のためのシステム |
JP2011201015A (ja) * | 1995-10-09 | 2011-10-13 | Ebara Corp | ポリッシング装置及び方法 |
US5876273A (en) * | 1996-04-01 | 1999-03-02 | Kabushiki Kaisha Toshiba | Apparatus for polishing a wafer |
US6231428B1 (en) | 1999-03-03 | 2001-05-15 | Mitsubishi Materials Corporation | Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring |
US6309290B1 (en) | 1999-03-03 | 2001-10-30 | Mitsubishi Materials Corporation | Chemical mechanical polishing head having floating wafer retaining ring and wafer carrier with multi-zone polishing pressure control |
US6368189B1 (en) | 1999-03-03 | 2002-04-09 | Mitsubishi Materials Corporation | Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
US7029382B2 (en) | 1999-03-03 | 2006-04-18 | Ebara Corporation | Apparatus for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
US7311586B2 (en) | 1999-03-03 | 2007-12-25 | Ebara Corporation | Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure |
CN103419122A (zh) * | 2013-08-13 | 2013-12-04 | 国家电网公司 | 一种镜板研磨平台 |
Also Published As
Publication number | Publication date |
---|---|
JPS6365473B2 (enrdf_load_stackoverflow) | 1988-12-15 |
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