JPS56140342A - Image forming composition and formation of resist image - Google Patents

Image forming composition and formation of resist image

Info

Publication number
JPS56140342A
JPS56140342A JP4338480A JP4338480A JPS56140342A JP S56140342 A JPS56140342 A JP S56140342A JP 4338480 A JP4338480 A JP 4338480A JP 4338480 A JP4338480 A JP 4338480A JP S56140342 A JPS56140342 A JP S56140342A
Authority
JP
Japan
Prior art keywords
contg
soln
compound
image
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4338480A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0128370B2 (enrdf_load_stackoverflow
Inventor
Yukio Ishida
Keizo Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP4338480A priority Critical patent/JPS56140342A/ja
Publication of JPS56140342A publication Critical patent/JPS56140342A/ja
Publication of JPH0128370B2 publication Critical patent/JPH0128370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP4338480A 1980-04-02 1980-04-02 Image forming composition and formation of resist image Granted JPS56140342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4338480A JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Publications (2)

Publication Number Publication Date
JPS56140342A true JPS56140342A (en) 1981-11-02
JPH0128370B2 JPH0128370B2 (enrdf_load_stackoverflow) 1989-06-02

Family

ID=12662312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4338480A Granted JPS56140342A (en) 1980-04-02 1980-04-02 Image forming composition and formation of resist image

Country Status (1)

Country Link
JP (1) JPS56140342A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (ja) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物
JP2008093090A (ja) * 2006-10-10 2008-04-24 Shinko:Kk 仕切り

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (enrdf_load_stackoverflow) * 1973-06-20 1975-04-05
JPS50125806A (enrdf_load_stackoverflow) * 1974-03-25 1975-10-03
JPS5546746A (en) * 1978-09-06 1980-04-02 Minnesota Mining & Mfg Positive type photosensitive composition and product thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (enrdf_load_stackoverflow) * 1973-06-20 1975-04-05
JPS50125806A (enrdf_load_stackoverflow) * 1974-03-25 1975-10-03
JPS5546746A (en) * 1978-09-06 1980-04-02 Minnesota Mining & Mfg Positive type photosensitive composition and product thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024545A (ja) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US5405720A (en) * 1985-08-07 1995-04-11 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
US5494784A (en) * 1985-08-07 1996-02-27 Japan Synthetic Rubber Co., Ltd. Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent
US5925492A (en) * 1985-08-07 1999-07-20 Jsr Corporation Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent
US6228554B1 (en) 1985-08-07 2001-05-08 Jsr Corporation Radiation-sensitive resin composition
US6270939B1 (en) 1985-08-07 2001-08-07 Jsr Corporation Radiation-sensitive resin composition
JPH01145649A (ja) * 1988-10-18 1989-06-07 Japan Synthetic Rubber Co Ltd ネガ型感放射線性樹脂組成物
JP2008093090A (ja) * 2006-10-10 2008-04-24 Shinko:Kk 仕切り

Also Published As

Publication number Publication date
JPH0128370B2 (enrdf_load_stackoverflow) 1989-06-02

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