JPS56138918A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56138918A
JPS56138918A JP4173780A JP4173780A JPS56138918A JP S56138918 A JPS56138918 A JP S56138918A JP 4173780 A JP4173780 A JP 4173780A JP 4173780 A JP4173780 A JP 4173780A JP S56138918 A JPS56138918 A JP S56138918A
Authority
JP
Japan
Prior art keywords
layers
sio2
substrate
adhered
polycrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4173780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6239810B2 (enrdf_load_stackoverflow
Inventor
Osamu Hataishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4173780A priority Critical patent/JPS56138918A/ja
Publication of JPS56138918A publication Critical patent/JPS56138918A/ja
Publication of JPS6239810B2 publication Critical patent/JPS6239810B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Recrystallisation Techniques (AREA)
JP4173780A 1980-03-31 1980-03-31 Manufacture of semiconductor device Granted JPS56138918A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4173780A JPS56138918A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4173780A JPS56138918A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS56138918A true JPS56138918A (en) 1981-10-29
JPS6239810B2 JPS6239810B2 (enrdf_load_stackoverflow) 1987-08-25

Family

ID=12616730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4173780A Granted JPS56138918A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56138918A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6239810B2 (enrdf_load_stackoverflow) 1987-08-25

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