JPS5613735A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5613735A JPS5613735A JP8952479A JP8952479A JPS5613735A JP S5613735 A JPS5613735 A JP S5613735A JP 8952479 A JP8952479 A JP 8952479A JP 8952479 A JP8952479 A JP 8952479A JP S5613735 A JPS5613735 A JP S5613735A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- gaas
- stacked
- masks
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Junction Field-Effect Transistors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8952479A JPS5613735A (en) | 1979-07-13 | 1979-07-13 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8952479A JPS5613735A (en) | 1979-07-13 | 1979-07-13 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5613735A true JPS5613735A (en) | 1981-02-10 |
JPS6331097B2 JPS6331097B2 (ko) | 1988-06-22 |
Family
ID=13973185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8952479A Granted JPS5613735A (en) | 1979-07-13 | 1979-07-13 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5613735A (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5884430A (ja) * | 1981-11-14 | 1983-05-20 | Daikin Ind Ltd | レジスト膜の耐エツチング性増大方法 |
JPS60253278A (ja) * | 1984-05-29 | 1985-12-13 | Sony Corp | 接合型電界効果型半導体装置の製法 |
US5074940A (en) * | 1990-06-19 | 1991-12-24 | Nippon Oil And Fats Co., Ltd. | Composition for gas generating |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5264284A (en) * | 1975-11-21 | 1977-05-27 | Mitsubishi Electric Corp | Semiconductor device |
JPS5348458A (en) * | 1976-10-14 | 1978-05-01 | Fujitsu Ltd | Production of semiconductor device |
-
1979
- 1979-07-13 JP JP8952479A patent/JPS5613735A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5264284A (en) * | 1975-11-21 | 1977-05-27 | Mitsubishi Electric Corp | Semiconductor device |
JPS5348458A (en) * | 1976-10-14 | 1978-05-01 | Fujitsu Ltd | Production of semiconductor device |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5884430A (ja) * | 1981-11-14 | 1983-05-20 | Daikin Ind Ltd | レジスト膜の耐エツチング性増大方法 |
JPS60253278A (ja) * | 1984-05-29 | 1985-12-13 | Sony Corp | 接合型電界効果型半導体装置の製法 |
JPH0713975B2 (ja) * | 1984-05-29 | 1995-02-15 | ソニー株式会社 | 接合型電界効果型半導体装置の製法 |
US5074940A (en) * | 1990-06-19 | 1991-12-24 | Nippon Oil And Fats Co., Ltd. | Composition for gas generating |
Also Published As
Publication number | Publication date |
---|---|
JPS6331097B2 (ko) | 1988-06-22 |
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