JPS56136968A - Method and apparatus for selectively deionizing chemical copper plating bath - Google Patents

Method and apparatus for selectively deionizing chemical copper plating bath

Info

Publication number
JPS56136968A
JPS56136968A JP3823780A JP3823780A JPS56136968A JP S56136968 A JPS56136968 A JP S56136968A JP 3823780 A JP3823780 A JP 3823780A JP 3823780 A JP3823780 A JP 3823780A JP S56136968 A JPS56136968 A JP S56136968A
Authority
JP
Japan
Prior art keywords
ions
copper plating
chemical copper
plating bath
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3823780A
Other languages
English (en)
Other versions
JPS6411716B2 (ja
Inventor
Hiroshi Kikuchi
Hitoshi Oka
Ataru Yokono
Haruo Suzuki
Toyofusa Yoshimura
Akira Matsuo
Osamu Miyazawa
Isamu Tanaka
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3823780A priority Critical patent/JPS56136968A/ja
Priority to US06/160,201 priority patent/US4324629A/en
Priority to NLAANVRAGE8003553,A priority patent/NL188683C/xx
Priority to DE3022962A priority patent/DE3022962C2/de
Publication of JPS56136968A publication Critical patent/JPS56136968A/ja
Publication of JPS6411716B2 publication Critical patent/JPS6411716B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
    • B01D61/44—Ion-selective electrodialysis

Landscapes

  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Health & Medical Sciences (AREA)
  • Urology & Nephrology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemically Coating (AREA)
JP3823780A 1979-06-19 1980-03-27 Method and apparatus for selectively deionizing chemical copper plating bath Granted JPS56136968A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3823780A JPS56136968A (en) 1980-03-27 1980-03-27 Method and apparatus for selectively deionizing chemical copper plating bath
US06/160,201 US4324629A (en) 1979-06-19 1980-06-17 Process for regenerating chemical copper plating solution
NLAANVRAGE8003553,A NL188683C (nl) 1979-06-19 1980-06-19 Werkwijze voor het regenereren van een bad voor het chemisch verkoperen.
DE3022962A DE3022962C2 (de) 1979-06-19 1980-06-19 Verfahren zum Regenerieren einer chemischen Verkupferungslösung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3823780A JPS56136968A (en) 1980-03-27 1980-03-27 Method and apparatus for selectively deionizing chemical copper plating bath

Publications (2)

Publication Number Publication Date
JPS56136968A true JPS56136968A (en) 1981-10-26
JPS6411716B2 JPS6411716B2 (ja) 1989-02-27

Family

ID=12519686

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3823780A Granted JPS56136968A (en) 1979-06-19 1980-03-27 Method and apparatus for selectively deionizing chemical copper plating bath

Country Status (1)

Country Link
JP (1) JPS56136968A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05306471A (ja) * 1991-05-17 1993-11-19 Hitachi Kasei Techno Plant Kk 無電解銅めっき液の生成方法及び生成装置
JP2010037573A (ja) * 2008-07-31 2010-02-18 Canon Electronics Inc 無電解めっき液の再生方法および再生装置
JP2014210976A (ja) * 2014-05-27 2014-11-13 キヤノン電子株式会社 無電解めっき液の再生方法および再生装置
JP7037023B1 (ja) * 2021-07-22 2022-03-16 生態環境部華南環境科学研究所 ピロリン酸銅めっき廃水中の銅およびリン資源をリサイクルする方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016055372A (ja) * 2014-09-08 2016-04-21 ファナック株式会社 イオン交換装置の寿命判定機能を備えた放電加工機

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120629A (ja) * 1984-07-09 1986-01-29 Hitachi Ltd バ−リング加工方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120629A (ja) * 1984-07-09 1986-01-29 Hitachi Ltd バ−リング加工方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05306471A (ja) * 1991-05-17 1993-11-19 Hitachi Kasei Techno Plant Kk 無電解銅めっき液の生成方法及び生成装置
JP2010037573A (ja) * 2008-07-31 2010-02-18 Canon Electronics Inc 無電解めっき液の再生方法および再生装置
JP2014210976A (ja) * 2014-05-27 2014-11-13 キヤノン電子株式会社 無電解めっき液の再生方法および再生装置
JP7037023B1 (ja) * 2021-07-22 2022-03-16 生態環境部華南環境科学研究所 ピロリン酸銅めっき廃水中の銅およびリン資源をリサイクルする方法

Also Published As

Publication number Publication date
JPS6411716B2 (ja) 1989-02-27

Similar Documents

Publication Publication Date Title
US3470044A (en) Electrolytic regeneration of spent ammonium persulfate etchants
US3880685A (en) Process and apparatus for etching copper and copper alloys
US4956097A (en) Waste treatment of metal containing solutions
JPS56136968A (en) Method and apparatus for selectively deionizing chemical copper plating bath
US5783061A (en) Method of removing iron compounds and chromium compounds from an aqueous electrolytic solution as well as the use of this method in electrochemical machining
JPS563666A (en) Method and apparatus for regenerating chemical copper plating solution
JPS56271A (en) Non-electrolytic copper plating solution
JPS5732360A (en) Method and device for regeneration of chemical copper plating solution
JPS56136967A (en) Method and apparatus for deionizing chemical copper plating bath
JPS5561997A (en) Treatment method for chemical cleaning waste water
GB2171688A (en) Process and apparatus for detoxifying nitrite-containing effluents
JPS5719344A (en) Removing method for copper from solution containing nickel and/or cobalt
JPS5576087A (en) Electroplating method for utilizing dross produced from zinc hot dipping bath as zinc source for electro zinc plating
SU915876A1 (ru) Способ регенерации отработанного раствора, медного травления 1
JPS5249652A (en) Process for treating a solution containing copper pyrophosphate comple x salts
JPS57188691A (en) Recovering method for gold from waste liquid of stripping of gold plating
JPS57200549A (en) Continuous regeneration of chemical copper plating liquid
Horn Automatic Control and Continuous Regeneration of an Electroless Copper Plating Bath
JPS5726134A (en) Removing method for cyanogen in plating waste liquor or waste water
JPS6451191A (en) Treatment of waste water containing cyan
Kunces How to treat spent electroless nickel baths
JPS5443134A (en) Metal washing water treatment system
JPS51121957A (en) Method of treating waste liquid
JPS54121241A (en) Reducing ferric ion in acidic, zn electroplating solution
JPS5279564A (en) Process for treating waste water