JPS56133737A - Photomask - Google Patents

Photomask

Info

Publication number
JPS56133737A
JPS56133737A JP3807880A JP3807880A JPS56133737A JP S56133737 A JPS56133737 A JP S56133737A JP 3807880 A JP3807880 A JP 3807880A JP 3807880 A JP3807880 A JP 3807880A JP S56133737 A JPS56133737 A JP S56133737A
Authority
JP
Japan
Prior art keywords
patterns
photomask
reticle
chip
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3807880A
Other languages
Japanese (ja)
Other versions
JPS6252849B2 (en
Inventor
Toshikiyo Ishiyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3807880A priority Critical patent/JPS56133737A/en
Publication of JPS56133737A publication Critical patent/JPS56133737A/en
Publication of JPS6252849B2 publication Critical patent/JPS6252849B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Abstract

PURPOSE:To surely perform a defect inspection of a photomask or the like for LSI with an automatic inspector by an adjacent chip pattern comparing system for forming adjacent chip patterns in vertical or horizontal arragement by projecting different reticle patterns. CONSTITUTION:In a defect inspection of a photomask formed by repeatedly arrangeing chip patterns of the same shape in a plurality of vertical and horizontal lines on a mask substrate, reticle 31 is prepared by forming two chip patterns A, A' 33 of the same shape on glass substrate 32. Using reticle 31 the 1st vertical line 35 and the 2nd vertical line 36 are formed in order on photomask forming substrate 34 by means of a photoreceptor while shifting patterns 33 by one chip pattern. A plurality of lines are formed in a similar way. Since there is little probability that reticle patterns A, A' have the same defect, the automatic inspection of the resulting photomask is surely performed by comparing adjacent patterns.
JP3807880A 1980-03-25 1980-03-25 Photomask Granted JPS56133737A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3807880A JPS56133737A (en) 1980-03-25 1980-03-25 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3807880A JPS56133737A (en) 1980-03-25 1980-03-25 Photomask

Publications (2)

Publication Number Publication Date
JPS56133737A true JPS56133737A (en) 1981-10-20
JPS6252849B2 JPS6252849B2 (en) 1987-11-07

Family

ID=12515446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3807880A Granted JPS56133737A (en) 1980-03-25 1980-03-25 Photomask

Country Status (1)

Country Link
JP (1) JPS56133737A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002065211A1 (en) * 2001-02-15 2002-08-22 Dai Nippon Printing Co., Ltd. Method of manufacturing phase shift mask and phase shift mask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619051A (en) * 1979-07-25 1981-02-23 Fujitsu Ltd Production of photo mask
JPS6161374A (en) * 1984-08-31 1986-03-29 Fuji Electric Corp Res & Dev Ltd Manufacture of rib-mounted porous plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619051A (en) * 1979-07-25 1981-02-23 Fujitsu Ltd Production of photo mask
JPS6161374A (en) * 1984-08-31 1986-03-29 Fuji Electric Corp Res & Dev Ltd Manufacture of rib-mounted porous plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002065211A1 (en) * 2001-02-15 2002-08-22 Dai Nippon Printing Co., Ltd. Method of manufacturing phase shift mask and phase shift mask
US7056624B2 (en) 2001-02-15 2006-06-06 Dai Nippon Printing Co., Ltd. Methods of manufacturing phase shift masks having etched substrate shifters with sidewalls rounded at top and bottom corners

Also Published As

Publication number Publication date
JPS6252849B2 (en) 1987-11-07

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