JPS5629239A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5629239A
JPS5629239A JP10464579A JP10464579A JPS5629239A JP S5629239 A JPS5629239 A JP S5629239A JP 10464579 A JP10464579 A JP 10464579A JP 10464579 A JP10464579 A JP 10464579A JP S5629239 A JPS5629239 A JP S5629239A
Authority
JP
Japan
Prior art keywords
defect
photomask
indicating mark
square
check
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10464579A
Other languages
Japanese (ja)
Inventor
Takayuki Yanagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10464579A priority Critical patent/JPS5629239A/en
Publication of JPS5629239A publication Critical patent/JPS5629239A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To facilitate a check of a product prepared by a photographic etching method, by forming a defect indicating mark on or near the defective pattern of a photomask. CONSTITUTION:A photomask is forwarded in such a manner that its incorrigible defect is not left as it is, but a defect indicating mark, for example, of diameter >=0.1mm., detectable by the naked eye is formed on or near the defect left. The defect indicating mark is usually formed in the range of square 2 corresponding to one device containing defect 3 in the patterns formed on glass substrate 1, and in the case of especially minute devices, only on the square containing defect 3, but also on the adjacent square the defect indicating mark may be attached. Since in such a photomask the defect is exaggerated, the defective product prepared with this photomask can be easily detected by naked-eye check and removed.
JP10464579A 1979-08-17 1979-08-17 Photomask Pending JPS5629239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10464579A JPS5629239A (en) 1979-08-17 1979-08-17 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10464579A JPS5629239A (en) 1979-08-17 1979-08-17 Photomask

Publications (1)

Publication Number Publication Date
JPS5629239A true JPS5629239A (en) 1981-03-24

Family

ID=14386184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10464579A Pending JPS5629239A (en) 1979-08-17 1979-08-17 Photomask

Country Status (1)

Country Link
JP (1) JPS5629239A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask

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