JPS5629239A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS5629239A JPS5629239A JP10464579A JP10464579A JPS5629239A JP S5629239 A JPS5629239 A JP S5629239A JP 10464579 A JP10464579 A JP 10464579A JP 10464579 A JP10464579 A JP 10464579A JP S5629239 A JPS5629239 A JP S5629239A
- Authority
- JP
- Japan
- Prior art keywords
- defect
- photomask
- indicating mark
- square
- check
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To facilitate a check of a product prepared by a photographic etching method, by forming a defect indicating mark on or near the defective pattern of a photomask. CONSTITUTION:A photomask is forwarded in such a manner that its incorrigible defect is not left as it is, but a defect indicating mark, for example, of diameter >=0.1mm., detectable by the naked eye is formed on or near the defect left. The defect indicating mark is usually formed in the range of square 2 corresponding to one device containing defect 3 in the patterns formed on glass substrate 1, and in the case of especially minute devices, only on the square containing defect 3, but also on the adjacent square the defect indicating mark may be attached. Since in such a photomask the defect is exaggerated, the defective product prepared with this photomask can be easily detected by naked-eye check and removed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10464579A JPS5629239A (en) | 1979-08-17 | 1979-08-17 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10464579A JPS5629239A (en) | 1979-08-17 | 1979-08-17 | Photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5629239A true JPS5629239A (en) | 1981-03-24 |
Family
ID=14386184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10464579A Pending JPS5629239A (en) | 1979-08-17 | 1979-08-17 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5629239A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856315A (en) * | 1981-09-29 | 1983-04-04 | Fujitsu Ltd | Quality information recording mask |
-
1979
- 1979-08-17 JP JP10464579A patent/JPS5629239A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856315A (en) * | 1981-09-29 | 1983-04-04 | Fujitsu Ltd | Quality information recording mask |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR850000787A (en) | Inspection method of photomask reticle for manufacturing semiconductor device | |
NO174245C (en) | Liquid composition suitable for forming a printed circuit board substrate, process for making such a composition, and use thereof. | |
JPS5629239A (en) | Photomask | |
KR880008731A (en) | Inspection method of part arrangement of printed circuit board and printed circuit board using same | |
JPS5788451A (en) | Photomask | |
JPS522547A (en) | Optical method to measure displacement of plane | |
JPS526526A (en) | Noctovisible indicator needle for the exposure meter | |
JPS5431282A (en) | Pattern formation method | |
KR910001875A (en) | Manufacturing Method of Exposure Mask | |
JPS5222479A (en) | Method of inspecting masks | |
JPS542657A (en) | Manufacture for semiconductor device | |
JPS5587149A (en) | Photomask for preparation of semiconductor wafer | |
KR950027940A (en) | vernier | |
JPS51129283A (en) | Examination method of glass bottles | |
JPS522598A (en) | Manufacturing method of card and the card | |
JPS57194530A (en) | Positioning of photomask substrate | |
JPS5491183A (en) | Production of semiconductor device | |
JPS5388578A (en) | Production of semiconductor device | |
JPS54116849A (en) | Magnetic bubble memory chip | |
JPS6425411A (en) | Semiconductor device | |
JPS51147281A (en) | Manufacturing process for thin film switching element | |
JPS5657038A (en) | Photomask for integrated circuit | |
JPS5421275A (en) | Photo mask for semiconductor wafer manufacture | |
JPS5489762A (en) | Holing inspection method | |
JPS537175A (en) | Minute marking method on semiconductor element surface |