JPS5856315A - Quality information recording mask - Google Patents

Abstract

PURPOSE:To contrive the prevention of errors in check-up as well as automation of the masking process for the titled mask by a method wherein the quality information of the mask is recorded as an indicating pattern at a part of the mask surface, with which the element pattern of a plurality of chips will be simultaneously formed. CONSTITUTION:A plurality of element patterns 2 and patterns 6, 7, 8 and 9 are arranged on the surface of a photomask 1. On these indicating patterns 6, 7, 8 and 9, the deviation of pattern measurements, which is the result of the quality inspection performed after completion of the mask patterns, and the information pertaining to the density and the location and the like of defective chips are entered. As regards the recording of information, the chromium film located on the mask is evaporated by a laser beam using the same method as that of a photo disk memory, and the method of recording is selected from the two methods, one is used for formation of small holes and the other is used to directly form alpha and numeric and the like according to the density of the information to be recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photomask for manufacturing semiconductor wafers and the like.

Conventionally, when using photomasks, necessary information was recorded on paper and attached to each seven masks during each manufacturing process, or magnetic cards, punch cards, etc. were used when managing the photomasks. The information attached to each mask was communicated and read. therefore,
Attachment of paper and cards causes complexity and inconvenience during storage and transportation.The present invention aims to eliminate the above-mentioned conventional drawbacks and to ensure that the necessary information is owned by the mask substrate itself. . The purpose is to create a multi-chip element pattern t'll'1 on the substrate.
Mask quality information is displayed on a part of the mask surface formed on jlt# as a putter/! Achieved by providing a quality information recording mask having the following characteristics: Hereinafter, an embodiment according to the invention will be described with reference to drawings. Figure 1 shows an example of a conventional photomask. o iig 1 Figure (a) is a U photomask 1, on whose surface an rL multiple device pattern 2 is arranged.

Using this photomask 1, a predetermined process mt- is carried out to simultaneously form a VC element pattern chip 4 on a wafer 3. For the photomask 1, mask name 5 representing the contents of the normal mask is valid as an element mask pattern. range lO
Figure 2 (a) Fi shows an example of a photomask according to the present invention, in which a plurality of element patterns 2 and display patterns 6,' are printed on the surface of the photomask l. 7, 8.9 and t arrangement. Display pattern 6, f, 8.9° is conventionally written on cards to check for deviations in pattern dimensions, positional accuracy, location of defective chips, etc. due to quality inspection after formation of a mask pattern. Fill in the information related to Information can be recorded in the same way as optical disk memory by evaporating the chromium film on the mask using a laser beam to form small holes with a diameter of 1 to 3 μm, or by forming small holes such as alphanumeric characters [contact formation or recording]. According to the information density k)!!O which can be selectively used, the present invention allows information to be embedded in a portion effective as a mask without affecting the element pattern density on the wafer. N during mask inspection: Verification errors that occur when automation is used to simultaneously record with a laser or when recording on different cards can be prevented.Also, it is possible to use multiple masks, which can exceed 10, which is required in the semiconductor wafer manufacturing process. This makes it possible to select a mask when combining masks that include defective element patterns, which is a problem when doing so, and to automatically set the mask. According to the invention, the quality information of the mask is contained in the mask itself, which simplifies handling, eliminates verification errors, and allows for the selection and combination of masks using Friendship@. Automation of mask etching becomes possible.

[Brief explanation of drawings]

FIG. 1 (SL), (b) U is a plan view of a conventional photomask and a wafer obtained using this photomask. FIG. 2 (SL) 1 (b) is a 6th plan view of a photomask and a wafer obtained by this photomask showing an embodiment according to the invention. In the figure, 1μ photomask, 2h element pattern, 3 wafer, 4 element pattern chip, 5n-r 1 name, 6. '71 e, 9 indicates butter 7° Figure 1 ((1) (b) Figure 7 ((1) ツ(b)

Claims (1)

[Claims] A quality information recording mask in which quality information of the mask is recorded as a t-indication pattern on a part of the mask surface on which element patterns of a plurality of chips are simultaneously formed on a substrate.