JPS5788450A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5788450A
JPS5788450A JP16433680A JP16433680A JPS5788450A JP S5788450 A JPS5788450 A JP S5788450A JP 16433680 A JP16433680 A JP 16433680A JP 16433680 A JP16433680 A JP 16433680A JP S5788450 A JPS5788450 A JP S5788450A
Authority
JP
Japan
Prior art keywords
photomask
control
region
information
quality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16433680A
Other languages
Japanese (ja)
Inventor
Toshio Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16433680A priority Critical patent/JPS5788450A/en
Publication of JPS5788450A publication Critical patent/JPS5788450A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To store information on quality and control of a photomask and to dispense with a control table file, by providing a magnetic storage region except the mask pattern region of the photomask for fabrication of integrated circuits. CONSTITUTION:A film of Fe, Ni, Co, or their alloys is formed on a region except the pattern area of a metal mask by the vapor deposition or electrochemical method, such as sulfate bath or chloride bath method to form a magnetic memory region, where quality information, such as inspection result, and control information, such as operation conditions or a number of uses are stored, thus permitting secure control to be executed without forming a control table the for controlling the photomask.
JP16433680A 1980-11-21 1980-11-21 Photomask Pending JPS5788450A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16433680A JPS5788450A (en) 1980-11-21 1980-11-21 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16433680A JPS5788450A (en) 1980-11-21 1980-11-21 Photomask

Publications (1)

Publication Number Publication Date
JPS5788450A true JPS5788450A (en) 1982-06-02

Family

ID=15791228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16433680A Pending JPS5788450A (en) 1980-11-21 1980-11-21 Photomask

Country Status (1)

Country Link
JP (1) JPS5788450A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104934A (en) * 1980-12-23 1982-06-30 Mitsubishi Electric Corp Photomask
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask
JPS61173943U (en) * 1985-04-18 1986-10-29

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104934A (en) * 1980-12-23 1982-06-30 Mitsubishi Electric Corp Photomask
JPS5856315A (en) * 1981-09-29 1983-04-04 Fujitsu Ltd Quality information recording mask
JPS61173943U (en) * 1985-04-18 1986-10-29

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