JPS56132343A - Mask for x-ray exposure and its manufacture - Google Patents

Mask for x-ray exposure and its manufacture

Info

Publication number
JPS56132343A
JPS56132343A JP3655380A JP3655380A JPS56132343A JP S56132343 A JPS56132343 A JP S56132343A JP 3655380 A JP3655380 A JP 3655380A JP 3655380 A JP3655380 A JP 3655380A JP S56132343 A JPS56132343 A JP S56132343A
Authority
JP
Japan
Prior art keywords
region
pattern
film
forming
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3655380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS631740B2 (cs
Inventor
Tadashi Nakamura
Keizo Hidejima
Teruo Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP3655380A priority Critical patent/JPS56132343A/ja
Publication of JPS56132343A publication Critical patent/JPS56132343A/ja
Publication of JPS631740B2 publication Critical patent/JPS631740B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3655380A 1980-03-22 1980-03-22 Mask for x-ray exposure and its manufacture Granted JPS56132343A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3655380A JPS56132343A (en) 1980-03-22 1980-03-22 Mask for x-ray exposure and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3655380A JPS56132343A (en) 1980-03-22 1980-03-22 Mask for x-ray exposure and its manufacture

Publications (2)

Publication Number Publication Date
JPS56132343A true JPS56132343A (en) 1981-10-16
JPS631740B2 JPS631740B2 (cs) 1988-01-13

Family

ID=12472944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3655380A Granted JPS56132343A (en) 1980-03-22 1980-03-22 Mask for x-ray exposure and its manufacture

Country Status (1)

Country Link
JP (1) JPS56132343A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5885433A (ja) * 1981-11-16 1983-05-21 Hitachi Ltd フオトマスク
US4606803A (en) * 1983-11-02 1986-08-19 U.S. Philips Corporation Method of manufacturing a mask for the production of patterns in lacquer layers by means of X-ray lithography

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11060193B2 (en) 2016-11-23 2021-07-13 Institut National De La Recherche Scientifique Method and system of laser-driven impact acceleration

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS52117557A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS5375770A (en) * 1976-12-17 1978-07-05 Hitachi Ltd X-ray copying mask
JPS55127559A (en) * 1979-03-26 1980-10-02 Fujitsu Ltd Blank mask for x-ray exposure and using method therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117558A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS52117557A (en) * 1976-03-30 1977-10-03 Toshiba Corp Soft x-ray exposure mask and its manufacturing method
JPS5375770A (en) * 1976-12-17 1978-07-05 Hitachi Ltd X-ray copying mask
JPS55127559A (en) * 1979-03-26 1980-10-02 Fujitsu Ltd Blank mask for x-ray exposure and using method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5885433A (ja) * 1981-11-16 1983-05-21 Hitachi Ltd フオトマスク
US4606803A (en) * 1983-11-02 1986-08-19 U.S. Philips Corporation Method of manufacturing a mask for the production of patterns in lacquer layers by means of X-ray lithography

Also Published As

Publication number Publication date
JPS631740B2 (cs) 1988-01-13

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