JPS56130748A - Formation of inert protective film - Google Patents

Formation of inert protective film

Info

Publication number
JPS56130748A
JPS56130748A JP3381380A JP3381380A JPS56130748A JP S56130748 A JPS56130748 A JP S56130748A JP 3381380 A JP3381380 A JP 3381380A JP 3381380 A JP3381380 A JP 3381380A JP S56130748 A JPS56130748 A JP S56130748A
Authority
JP
Japan
Prior art keywords
film
fluorocarbon
protecting film
high polymer
hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3381380A
Other languages
Japanese (ja)
Other versions
JPS6148707B2 (en
Inventor
Kazufumi Ogawa
Isamu Kitahiro
Yoshiko Yasuda
Taketoshi Yonezawa
Shigeru Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3381380A priority Critical patent/JPS56130748A/en
Publication of JPS56130748A publication Critical patent/JPS56130748A/en
Publication of JPS6148707B2 publication Critical patent/JPS6148707B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To form an extremely thin high polymer film of fluorocarbon on a substrate with good adhesiveness by treating the hydrocarbon resin film provided on the substrate surface with fluorocarbon gas plasma. CONSTITUTION:In the case of adapting this method to a substrate such as a photomask, a protecting film 12 of about 1-2mu thickness consisting of a high polymer of hydrocarbon (for example, acrylic resin of good transparency) is formed on a photomask 11 (a symbol 15 is a mask pattern), thence this is treated for a few minutes in the fluorocarbon gas plasma to cut the bond of the hydrocarbon in the surface of the protecting film 12 and rebond the same to fluorine radicals, whereby the surface of the protecting film 12 is changed to a high polymer film 13 of fluorocarbon and an inert protecting film is provided. The above-mentioned method is effectively applicable for surface protection of records, video discs, magnetic tapes, etc. as well.
JP3381380A 1980-03-17 1980-03-17 Formation of inert protective film Granted JPS56130748A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3381380A JPS56130748A (en) 1980-03-17 1980-03-17 Formation of inert protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3381380A JPS56130748A (en) 1980-03-17 1980-03-17 Formation of inert protective film

Publications (2)

Publication Number Publication Date
JPS56130748A true JPS56130748A (en) 1981-10-13
JPS6148707B2 JPS6148707B2 (en) 1986-10-25

Family

ID=12396910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3381380A Granted JPS56130748A (en) 1980-03-17 1980-03-17 Formation of inert protective film

Country Status (1)

Country Link
JP (1) JPS56130748A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116656A (en) * 1990-09-07 1992-04-17 Mitsubishi Electric Corp Photomask and its production
JPH11309209A (en) * 1998-04-30 1999-11-09 Seiko Takane:Kk Device for injecting contrast medium
EP1128211A1 (en) * 2000-02-21 2001-08-29 Motorola, Inc. Lithographic printing method using a low surface energy layer
JP2002214761A (en) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd Photomask for photolithography and method for manufacturing the same
US6562553B2 (en) 1998-11-24 2003-05-13 Motorola, Inc. Lithographic printing method using a low surface energy layer
JP2004537070A (en) * 2001-07-26 2004-12-09 マイクロ リソグラフィー， インコーポレイテッド Photomask coated with fluoropolymer for photoengraving
JP2016018187A (en) * 2014-07-11 2016-02-01 株式会社ディスコ Method for producing exposure mask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0225362Y2 (en) * 1986-07-30 1990-07-12

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116656A (en) * 1990-09-07 1992-04-17 Mitsubishi Electric Corp Photomask and its production
JPH11309209A (en) * 1998-04-30 1999-11-09 Seiko Takane:Kk Device for injecting contrast medium
US6562553B2 (en) 1998-11-24 2003-05-13 Motorola, Inc. Lithographic printing method using a low surface energy layer
EP1128211A1 (en) * 2000-02-21 2001-08-29 Motorola, Inc. Lithographic printing method using a low surface energy layer
JP2002214761A (en) * 2001-01-16 2002-07-31 Dainippon Printing Co Ltd Photomask for photolithography and method for manufacturing the same
JP2004537070A (en) * 2001-07-26 2004-12-09 マイクロ リソグラフィー， インコーポレイテッド Photomask coated with fluoropolymer for photoengraving
JP2016018187A (en) * 2014-07-11 2016-02-01 株式会社ディスコ Method for producing exposure mask

Also Published As

Publication number Publication date
JPS6148707B2 (en) 1986-10-25

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