JPS56125742A - Method for correcting photomask pattern defect - Google Patents

Method for correcting photomask pattern defect

Info

Publication number
JPS56125742A
JPS56125742A JP2898380A JP2898380A JPS56125742A JP S56125742 A JPS56125742 A JP S56125742A JP 2898380 A JP2898380 A JP 2898380A JP 2898380 A JP2898380 A JP 2898380A JP S56125742 A JPS56125742 A JP S56125742A
Authority
JP
Japan
Prior art keywords
film
defect
mask
light shielding
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2898380A
Other languages
Japanese (ja)
Inventor
Shigeo Uotani
Kuniaki Miyake
Katsuhiro Hirata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2898380A priority Critical patent/JPS56125742A/en
Publication of JPS56125742A publication Critical patent/JPS56125742A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To eliminate necessity for detection of defect positions of each sheet and spot exposure, by using positive and negative type resists and another photomask having the same pattern as a mask in order to correct a light shielding film having light passing defects. CONSTITUTION:Light shielding film 2, such as Cr film having light transmitting defect 4 and positive type resist film 5 for covering glass substrate 1 are formed, after that, uniformly exposed from the side of substrate 1, and developed to disclose uniformly coated, then, light shielding film 2a having the same pattern as that of the photomask to be corrected and a mask having light transmitting part 3a are placed on film 7, and this is exposed L and developed. Vapor deposited film, such as Cr 6 is formed on the whole surface including defect 4. The residual resist films 5, 7 are removed together with film 6 on resist 7 so as to leave vapor deposited film 6 on defect 4. Even if a defect is present on another photomask, since the probability of presence of a defect on the same position as that of the mask to be corrected is extremely small, it can be satisfactorily used for correction.
JP2898380A 1980-03-05 1980-03-05 Method for correcting photomask pattern defect Pending JPS56125742A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2898380A JPS56125742A (en) 1980-03-05 1980-03-05 Method for correcting photomask pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2898380A JPS56125742A (en) 1980-03-05 1980-03-05 Method for correcting photomask pattern defect

Publications (1)

Publication Number Publication Date
JPS56125742A true JPS56125742A (en) 1981-10-02

Family

ID=12263644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2898380A Pending JPS56125742A (en) 1980-03-05 1980-03-05 Method for correcting photomask pattern defect

Country Status (1)

Country Link
JP (1) JPS56125742A (en)

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