JPS56114315A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS56114315A JPS56114315A JP1686180A JP1686180A JPS56114315A JP S56114315 A JPS56114315 A JP S56114315A JP 1686180 A JP1686180 A JP 1686180A JP 1686180 A JP1686180 A JP 1686180A JP S56114315 A JPS56114315 A JP S56114315A
- Authority
- JP
- Japan
- Prior art keywords
- flattened
- substrate
- scratches
- fused
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- 230000002159 abnormal effect Effects 0.000 abstract 2
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 239000010979 ruby Substances 0.000 abstract 1
- 229910001750 ruby Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1686180A JPS56114315A (en) | 1980-02-14 | 1980-02-14 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1686180A JPS56114315A (en) | 1980-02-14 | 1980-02-14 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56114315A true JPS56114315A (en) | 1981-09-08 |
Family
ID=11927993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1686180A Pending JPS56114315A (en) | 1980-02-14 | 1980-02-14 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56114315A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011096935A (ja) * | 2009-10-30 | 2011-05-12 | Fujifilm Corp | エピタキシャルウエハ、エピタキシャルウエハの製造方法、発光素子ウエハ、発光素子ウエハの製造方法、及び発光素子 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51120671A (en) * | 1975-04-16 | 1976-10-22 | Fujitsu Ltd | Photomask fault processing method |
JPS51121266A (en) * | 1975-03-31 | 1976-10-23 | Western Electric Co | Method of removing projected portion of epitaxial layer |
JPS52125269A (en) * | 1976-04-14 | 1977-10-20 | Nec Corp | Removing device for projecting defects from wafer |
JPS5527686A (en) * | 1978-08-21 | 1980-02-27 | Sony Corp | Projection eliminating device |
-
1980
- 1980-02-14 JP JP1686180A patent/JPS56114315A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51121266A (en) * | 1975-03-31 | 1976-10-23 | Western Electric Co | Method of removing projected portion of epitaxial layer |
JPS51120671A (en) * | 1975-04-16 | 1976-10-22 | Fujitsu Ltd | Photomask fault processing method |
JPS52125269A (en) * | 1976-04-14 | 1977-10-20 | Nec Corp | Removing device for projecting defects from wafer |
JPS5527686A (en) * | 1978-08-21 | 1980-02-27 | Sony Corp | Projection eliminating device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011096935A (ja) * | 2009-10-30 | 2011-05-12 | Fujifilm Corp | エピタキシャルウエハ、エピタキシャルウエハの製造方法、発光素子ウエハ、発光素子ウエハの製造方法、及び発光素子 |
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