JPS56111260A - Charge transfer element - Google Patents
Charge transfer elementInfo
- Publication number
- JPS56111260A JPS56111260A JP1418780A JP1418780A JPS56111260A JP S56111260 A JPS56111260 A JP S56111260A JP 1418780 A JP1418780 A JP 1418780A JP 1418780 A JP1418780 A JP 1418780A JP S56111260 A JPS56111260 A JP S56111260A
- Authority
- JP
- Japan
- Prior art keywords
- gate electrodes
- gate
- film
- electrodes
- row
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 238000002955 isolation Methods 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42396—Gate electrodes for field effect devices for charge coupled devices
Abstract
PURPOSE:To heighten the isolation voltage between the gate electrodes and obtain a flat surface of the device, by aligning polycrystalline gate electrodes on a gate oxide film in a row with minimum intervals. CONSTITUTION:A gate SiO2 film 2 is formed on a Si substrate 1. On the film 2 the polycrystalline Si gate electrodes 3 are formed in a row with an interval smaller than the thickness of the electrode 3. Each interval between the electrodes 3 is filled with SiO2 layer 4'. With such an arrangement, the isolation voltage between the gate electrodes can be maintained at an extreme high level. Moreover the roughness on surface of the device is considerably decreased. Thus the disconnection of the metallic wiring layer formed on the surface of the device can be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1418780A JPS56111260A (en) | 1980-02-07 | 1980-02-07 | Charge transfer element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1418780A JPS56111260A (en) | 1980-02-07 | 1980-02-07 | Charge transfer element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56111260A true JPS56111260A (en) | 1981-09-02 |
JPS648473B2 JPS648473B2 (en) | 1989-02-14 |
Family
ID=11854115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1418780A Granted JPS56111260A (en) | 1980-02-07 | 1980-02-07 | Charge transfer element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56111260A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS519582A (en) * | 1974-07-13 | 1976-01-26 | Oki Electric Ind Co Ltd | |
JPS5150964U (en) * | 1974-10-16 | 1976-04-17 | ||
JPS52155070A (en) * | 1976-06-18 | 1977-12-23 | Matsushita Electric Ind Co Ltd | Production of ccd |
-
1980
- 1980-02-07 JP JP1418780A patent/JPS56111260A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS519582A (en) * | 1974-07-13 | 1976-01-26 | Oki Electric Ind Co Ltd | |
JPS5150964U (en) * | 1974-10-16 | 1976-04-17 | ||
JPS52155070A (en) * | 1976-06-18 | 1977-12-23 | Matsushita Electric Ind Co Ltd | Production of ccd |
Also Published As
Publication number | Publication date |
---|---|
JPS648473B2 (en) | 1989-02-14 |
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