JPS56108880A - Selectively etching method for silicon oxide film - Google Patents

Selectively etching method for silicon oxide film

Info

Publication number
JPS56108880A
JPS56108880A JP960080A JP960080A JPS56108880A JP S56108880 A JPS56108880 A JP S56108880A JP 960080 A JP960080 A JP 960080A JP 960080 A JP960080 A JP 960080A JP S56108880 A JPS56108880 A JP S56108880A
Authority
JP
Japan
Prior art keywords
silicon oxide
film
oxide film
resist
selectively
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP960080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS628513B2 (enrdf_load_stackoverflow
Inventor
Akira Abiru
Yoshiaki Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP960080A priority Critical patent/JPS56108880A/ja
Publication of JPS56108880A publication Critical patent/JPS56108880A/ja
Publication of JPS628513B2 publication Critical patent/JPS628513B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP960080A 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film Granted JPS56108880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP960080A JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP960080A JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Publications (2)

Publication Number Publication Date
JPS56108880A true JPS56108880A (en) 1981-08-28
JPS628513B2 JPS628513B2 (enrdf_load_stackoverflow) 1987-02-23

Family

ID=11724801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP960080A Granted JPS56108880A (en) 1980-01-30 1980-01-30 Selectively etching method for silicon oxide film

Country Status (1)

Country Link
JP (1) JPS56108880A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62116786A (ja) * 1985-11-13 1987-05-28 Nec Corp 表面選択処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62116786A (ja) * 1985-11-13 1987-05-28 Nec Corp 表面選択処理方法

Also Published As

Publication number Publication date
JPS628513B2 (enrdf_load_stackoverflow) 1987-02-23

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