JPS56105634A - X rays transcription device - Google Patents

X rays transcription device

Info

Publication number
JPS56105634A
JPS56105634A JP806980A JP806980A JPS56105634A JP S56105634 A JPS56105634 A JP S56105634A JP 806980 A JP806980 A JP 806980A JP 806980 A JP806980 A JP 806980A JP S56105634 A JPS56105634 A JP S56105634A
Authority
JP
Japan
Prior art keywords
rays
stage
detected
time
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP806980A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Fumio Yamagishi
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP806980A priority Critical patent/JPS56105634A/en
Publication of JPS56105634A publication Critical patent/JPS56105634A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To shorten broadly the necessary time for the device to transcribe a pattern by a method wherein a stage is made to transfer consecutively, and at the time when an exposing region to be exposed reaches to the prescribed position is caught during the transference, the X ray source is driven. CONSTITUTION:The stage 15 laying on it a sample to be exposed transfers consecutively being driven by both driving motors 17, 18 in the X, Y axial directions. At this time, the timing when the alignment marks 21, 22 on an X rays mask 3 and on an X rays resist 2 coincides is detected with a photo detector consisting of a photo projector 23, a photo receiver 24, and the detected output is applied to an X rays source 7 to make the X rays source 7 to radiate X rays 8. The radiated X rays expose precisely through the mask 3 the prescribed exposing region in the lump specified on the resist 2. Both X, Y stage position detectors 19, 20 are used for the positioning of respective exposing regions when the pattern is to be transcribed by the X rays exposure, and the position of the stage 15 is corrected by feeding back the detected outputs from the detectors 19, 20 to respectively corresponding monitors 17, 18.
JP806980A 1980-01-25 1980-01-25 X rays transcription device Pending JPS56105634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP806980A JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP806980A JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Publications (1)

Publication Number Publication Date
JPS56105634A true JPS56105634A (en) 1981-08-22

Family

ID=11683046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP806980A Pending JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Country Status (1)

Country Link
JP (1) JPS56105634A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003863A1 (en) * 2004-06-30 2006-01-12 Integrated Solutions Co., Ltd. Exposure equipment
WO2007069480A1 (en) * 2005-12-17 2007-06-21 Sharp Kabushiki Kaisha Aligner and aligning method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS5021232A (en) * 1973-06-28 1975-03-06
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS5021232A (en) * 1973-06-28 1975-03-06
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003863A1 (en) * 2004-06-30 2006-01-12 Integrated Solutions Co., Ltd. Exposure equipment
WO2007069480A1 (en) * 2005-12-17 2007-06-21 Sharp Kabushiki Kaisha Aligner and aligning method

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