JPS51119227A - Method of preparing an uneven image formation - Google Patents

Method of preparing an uneven image formation

Info

Publication number
JPS51119227A
JPS51119227A JP3905975A JP3905975A JPS51119227A JP S51119227 A JPS51119227 A JP S51119227A JP 3905975 A JP3905975 A JP 3905975A JP 3905975 A JP3905975 A JP 3905975A JP S51119227 A JPS51119227 A JP S51119227A
Authority
JP
Japan
Prior art keywords
preparing
image formation
uneven image
uneven
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3905975A
Other languages
Japanese (ja)
Inventor
Tadao Kaneko
Motoo Akagi
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3905975A priority Critical patent/JPS51119227A/en
Publication of JPS51119227A publication Critical patent/JPS51119227A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)

Abstract

PURPOSE:When obtaining an uneven image by irradiation using a negative photoresist, high sensitivity and high resolution image is obtained, by processing it through polyhydric phenol series solution after its development.
JP3905975A 1975-04-02 1975-04-02 Method of preparing an uneven image formation Pending JPS51119227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3905975A JPS51119227A (en) 1975-04-02 1975-04-02 Method of preparing an uneven image formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3905975A JPS51119227A (en) 1975-04-02 1975-04-02 Method of preparing an uneven image formation

Publications (1)

Publication Number Publication Date
JPS51119227A true JPS51119227A (en) 1976-10-19

Family

ID=12542550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3905975A Pending JPS51119227A (en) 1975-04-02 1975-04-02 Method of preparing an uneven image formation

Country Status (1)

Country Link
JP (1) JPS51119227A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141128A (en) * 1978-04-25 1979-11-02 Fuji Photo Film Co Ltd Processing method of picture image forming material
JPS63161444A (en) * 1986-12-25 1988-07-05 Dainippon Ink & Chem Inc Hologram image forming material
JPH01167880A (en) * 1987-12-24 1989-07-03 Dainippon Ink & Chem Inc Horographic optical element and its manufacture

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141128A (en) * 1978-04-25 1979-11-02 Fuji Photo Film Co Ltd Processing method of picture image forming material
JPS6127735B2 (en) * 1978-04-25 1986-06-26 Fuji Photo Film Co Ltd
JPS63161444A (en) * 1986-12-25 1988-07-05 Dainippon Ink & Chem Inc Hologram image forming material
JPH01167880A (en) * 1987-12-24 1989-07-03 Dainippon Ink & Chem Inc Horographic optical element and its manufacture

Similar Documents

Publication Publication Date Title
JPS5420719A (en) Photosensitive material for image formation and image formation method
JPS5280022A (en) Light solubilizable composition
JPS51119227A (en) Method of preparing an uneven image formation
JPS5226171A (en) Mask creation method
JPS5258374A (en) Improvement in sensitivity of positive type photo resist
JPS51130222A (en) A process for producing an electron beam resist image
JPS51114931A (en) Photoresist pattern formation method
JPS52149978A (en) Developing treatment method of photoresist film
JPS51148370A (en) Electron ray exposure method
JPS5229726A (en) Photosensitive material and method of forming image on it
JPS5215267A (en) Fine processing method
JPS5352133A (en) Electrophotographic method
JPS5277671A (en) Method and equipment of masking
JPS52138872A (en) Exposure times counting apparatus of electron beam exposure device
JPS5223327A (en) Method for producing image formation material
JPS5218320A (en) Image forming method
JPS527682A (en) Method of detecting defects in photoresists
JPS5350978A (en) Electron beam exposure method
JPS522534A (en) Electrophtographic copying method and apparatus
JPS525527A (en) Producing method of color printing
JPS51136437A (en) A process for inspecting signal quality
JPS5210680A (en) Method of manufacturing photo-mask for photo etching
JPS51136430A (en) A process of producing an electron photographic image and its device
JPS53118980A (en) Exposing method of electron ray
JPS5381071A (en) Origin aligning method