JPS63161444A - Hologram image forming material - Google Patents
Hologram image forming materialInfo
- Publication number
- JPS63161444A JPS63161444A JP30775386A JP30775386A JPS63161444A JP S63161444 A JPS63161444 A JP S63161444A JP 30775386 A JP30775386 A JP 30775386A JP 30775386 A JP30775386 A JP 30775386A JP S63161444 A JPS63161444 A JP S63161444A
- Authority
- JP
- Japan
- Prior art keywords
- image forming
- forming material
- plastic sheet
- photosensitive
- photosensitive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 29
- 239000002985 plastic film Substances 0.000 claims abstract description 12
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 claims abstract description 5
- BKZFVHIMLVBUGP-UHFFFAOYSA-N (2-prop-2-enoyloxyphenyl) prop-2-enoate Chemical group C=CC(=O)OC1=CC=CC=C1OC(=O)C=C BKZFVHIMLVBUGP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229920000642 polymer Polymers 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 12
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract description 6
- 229920000728 polyester Polymers 0.000 abstract description 3
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 abstract description 2
- 229930016911 cinnamic acid Natural products 0.000 abstract description 2
- 235000013985 cinnamic acid Nutrition 0.000 abstract description 2
- 229920000515 polycarbonate Polymers 0.000 abstract description 2
- 239000004417 polycarbonate Substances 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229940114081 cinnamate Drugs 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- -1 /rivinyl petyral Polymers 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- AAFXQFIGKBLKMC-KQQUZDAGSA-N (e)-3-[4-[(e)-2-carboxyethenyl]phenyl]prop-2-enoic acid Chemical compound OC(=O)\C=C\C1=CC=C(\C=C\C(O)=O)C=C1 AAFXQFIGKBLKMC-KQQUZDAGSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- ZFCNOKDRWHSHNR-UHFFFAOYSA-N 3-[2-(2-carboxyethenyl)phenyl]prop-2-enoic acid Chemical group OC(=O)C=CC1=CC=CC=C1C=CC(O)=O ZFCNOKDRWHSHNR-UHFFFAOYSA-N 0.000 description 1
- KRXUBZPHAPGHPE-UHFFFAOYSA-N 3-[3-(2-carboxyethenyl)phenyl]prop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=CC(C=CC(O)=O)=C1 KRXUBZPHAPGHPE-UHFFFAOYSA-N 0.000 description 1
- BKLINPKRZIJUBZ-UHFFFAOYSA-N 3-[4-(2-carboxyethenyl)-3-nitrophenyl]prop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=C(C=CC(O)=O)C([N+]([O-])=O)=C1 BKLINPKRZIJUBZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 」ノ 本発明は、ホログラム画像形成材料に関する。[Detailed description of the invention] [Industrial application field] "of FIELD OF THE INVENTION This invention relates to holographic imaging materials.
更に詳しくは、あらかじめ感光性を付与した貯蔵安定性
に優れたホログラム画像形成用材料に関する。More specifically, the present invention relates to a hologram image forming material that has been previously imparted with photosensitivity and has excellent storage stability.
近年、三次元ディスプレイ用途にホログラムが注目され
てきている。なかでも、二ンがスホログラムは、ホログ
ラムの量産に最も有望な方法となっており、これに不可
欠なレリーフホログラムの需要が高まシつつある。従来
、レリーフホログラムの画像形成用材料は、撮影直前に
感光性組成物溶液をガラス板等の取り扱いに注意を要す
る基板上に塗布することによって調整されている。この
調整には１作業者の相当な熟練度が必要であシ、又、調
整される乾板は作業環境に大きく影響さ詐る為に、ばら
つきが多く、ホログラムの作製を困難なものにしている
大きなぶ因となっている。In recent years, holograms have been attracting attention for three-dimensional display applications. Among them, the double hologram is the most promising method for mass production of holograms, and the demand for relief holograms, which are essential for this, is increasing. Conventionally, image forming materials for relief holograms have been prepared by applying a photosensitive composition solution onto a substrate that must be handled with care, such as a glass plate, immediately before imaging. This adjustment requires considerable skill on the part of one operator, and since the dry plate to be adjusted is greatly affected by the working environment, there are many variations, making it difficult to produce holograms. This is a major cause.
一方、ホログラム画像形成用材料としては、現状ではポ
ジ呈フォトレジストに限定されているが、Ｉジ型フォト
レジストのレーザー光に対する感度が低いために、長い
露光時間が必要となっており、その結果、ホログラムの
作製効率が低いものとなりている。On the other hand, materials for forming hologram images are currently limited to positive photoresists, but due to the low sensitivity of I-type photoresists to laser light, long exposure times are required; , the hologram production efficiency is low.
本発明は、あらかじめ基板に感光層が設けられたホログ
ラム画像形成用材料を提供するものであシ、撮影前にお
ける乾板の作製というわずられしい作業を省くとともに
、一定品質の画像形成用材料を提供することにより、露
光量、現像時間を調整するというわずられしい操作も省
ける等、ホログラムの作製作業を簡便ならしめ、さらに
は感光層の材料としてネガ型感光性組成物を使用するこ
とにより、露光時間を短縮できるホログラム画像形成用
材料を提供することを目的とする。The present invention provides a holographic image forming material in which a photosensitive layer is provided on a substrate in advance, and it eliminates the troublesome work of preparing a dry plate before photographing, and provides an image forming material of a constant quality. By providing holograms, it is possible to simplify the hologram production work by eliminating the troublesome operations of adjusting the exposure amount and development time, and furthermore, by using a negative-tone photosensitive composition as the material for the photosensitive layer. An object of the present invention is to provide a hologram image forming material that can shorten exposure time.
感光性組成物溶液をホログラム撮影直前にガラス板上に
塗布して乾板を作製する作業は、ガラス基板の洗浄、ス
ピンナーによる塗布、塗膜乾燥条件のコントロール等、
繁雑であり、発明者らは、工程簡素化の観点より、種々
検討した結果、透明もしくは半透明のプラスチックシー
ト上にあらかじめネガ型感光性組成物より成る感光層を
形成して成るホログラム画像形成用材料が安定したレリ
ーフホログラムを形成す′ることを見い出し、゛本発明
を完成するに至りた。The work of applying a photosensitive composition solution onto a glass plate to prepare a dry plate immediately before photographing a hologram involves cleaning the glass substrate, applying with a spinner, controlling coating drying conditions, etc.
However, from the viewpoint of simplifying the process, the inventors conducted various studies and found a method for forming hologram images in which a photosensitive layer made of a negative photosensitive composition is formed in advance on a transparent or translucent plastic sheet. It was discovered that the material forms a stable relief hologram, and the present invention was completed.
本発明で用いることのできる透明もしくは半透明のプラ
スチックシートとしては、例えばポリエステル、ぼりカ
ー−ネート、ポリエステルポリカー＆＄−）、／’Ｊエ
チレン、ポリグロビレン、？リサルホン、セルロースア
セテート、／リビニルプチラール、ポリスチレン、ＰＶ
Ａ等が挙げられる。Transparent or translucent plastic sheets that can be used in the present invention include, for example, polyester, paper carnate, polyester polycarbonate, /'J ethylene, polyglobylene, ? Resulfone, cellulose acetate, /rivinyl petyral, polystyrene, PV
Examples include A.
厚さは、１０〜５００μｍ程度が好ましい。The thickness is preferably about 10 to 500 μm.
必要により、ハレーション防止層を！ラスチッ。Add an anti-halation layer if necessary! Last tick.
クシートの裏面もしくは、プラスチックシートと感光層
の間に設けることもできる。It can also be provided on the back side of the plastic sheet or between the plastic sheet and the photosensitive layer.
フェニレンジアクリレート基及び／又はケイ皮酸を主鎖
もしくは側鎖に含有する重合体を主成分とする水性アル
カリ現像液で現像可能なネガ型感光性組成物については
、例えば、特開昭６０−１６５６４６号公報、特開昭６
１−１５８６０号公報および特開昭６１−５５６４３号
公報等に記載されておシ、プレセンシタイズドシー）（
Ｐ８版）用の感光材料として一部実用化されている。For negative photosensitive compositions that can be developed with an aqueous alkaline developer containing as a main component a polymer containing phenylene diacrylate groups and/or cinnamic acid in the main chain or side chain, for example, JP-A-60-1999 Publication No. 165646, Japanese Unexamined Patent Publication No. 6
1-15860 and JP-A-61-55643, etc., presensitized sea) (
It has been partially put into practical use as a photosensitive material for P8 version).
感光層は、上記プラスチックシート上にネガ型感光性組
成物溶液をパーコーター、ロールコータ−等の適宜な塗
布方法によりて形成される。The photosensitive layer is formed by applying a negative photosensitive composition solution onto the plastic sheet using an appropriate coating method such as a percoater or a roll coater.
このようにして得られたホログラム画像形成用材料は、
室温下で１〜３年という長期間安定に保存でき、ホログ
ラム撮影時には、そのまま乾板として用いることができ
る。さらには、本発明のホログラムの画像形成材料を用
いると、レーザー露光、現像操作により再現性の高いレ
リーフホログラムを形成することができる。The thus obtained hologram image forming material is
It can be stored stably at room temperature for a long period of 1 to 3 years, and can be used as a dry plate for hologram photography. Furthermore, when the hologram image forming material of the present invention is used, a relief hologram with high reproducibility can be formed by laser exposure and development operations.
以下、実施例により、本発明を具体的に説明する。Hereinafter, the present invention will be specifically explained with reference to Examples.
（感光性樹脂の製造）
ｐ−７エニレンジアクリレート酸ジエチル５４．８ＩＩ
（０，２モル）とビスフェノールＡ（１モル）のエチレ
ンオヤサイド（６，２モル）付加体１３３．２１１（０
，２６６モル）を、触媒（ゾツチル錫オキサイド６００
ダ）、禁止剤（フェノチアジン６０■）と共に攪拌装置
、窒素ガス導入管、温度計および留出管を備えた反応器
に仕込み、窒素ガス雰囲気下で攪拌しつつ１９０℃に加
温して反応を開始した。(Production of photosensitive resin) Diethyl p-7 enylene diacrylate 54.8II
(0.2 mol) and bisphenol A (1 mol) with ethylene oxide (6.2 mol) adduct 133.211 (0
, 266 mol) and the catalyst (Zotutyltin oxide 600 mol).
D) and an inhibitor (phenothiazine 60cm) were charged into a reactor equipped with a stirring device, a nitrogen gas inlet tube, a thermometer, and a distillation tube, and the reaction was carried out by heating to 190°C while stirring in a nitrogen gas atmosphere. It started.
その後３時間半に亘って加熱、攪拌を続け、反応により
生成するエタノールを完全に留去させ水酸基価４６．５
の線状Ｉリエステル樹脂を得た。After that, heating and stirring were continued for 3 and a half hours, and the ethanol produced by the reaction was completely distilled off, resulting in a hydroxyl value of 46.5.
A linear I-lyester resin was obtained.
上記線状ポリエステル樹脂１００Ｎを１４０℃に加温、
攪拌し、ピロメリット酸二無水物９．Ｏｊｌを仕込み、
窒素雰囲気下、常圧で２０分間、攪拌を続けた後、５１
価４３．５の側鎖カルゲキシル基含有感光性ポリエステ
ル樹脂を得た。Heating the above linear polyester resin 100N to 140°C,
Stir and add pyromellitic dianhydride9. Prepare Ojl,
After continuing stirring for 20 minutes at normal pressure under nitrogen atmosphere, 51
A side chain calgexyl group-containing photosensitive polyester resin having a value of 43.5 was obtained.
実施例１
前記の感光性樹脂をシフ田ヘキサンに溶解し、不揮発分
７％の感光性樹脂溶液を調合し、Ａ１０のパーコーター
を用いて、この溶液を４リエステルフイルム（大日本イ
ンキ化学工業（［ＤＩＣルミラーＴ、２５０Ｊｇｍ厚）
上に、塗布し、１２０℃で１０分間熱処理して、ホログ
ラム画像形成用材料を得た。Example 1 The photosensitive resin described above was dissolved in Schifta hexane to prepare a photosensitive resin solution with a non-volatile content of 7%, and this solution was coated with a 4-lyester film (Dainippon Ink & Chemicals Co., Ltd.) using an A10 percoater. DIC Lumirror T, 250Jgm thickness)
It was coated on top and heat treated at 120° C. for 10 minutes to obtain a hologram image forming material.
空冷式アルデンレーザーを出力源として、二光束干渉系
の光学系を組み立て、前記のホログラム画像形成用材料
を乾板ホルダーにセットし、１５秒間レーデ−露光を行
なった。照射後、感光層を２０℃の水性アルカリ現像液
で３０秒間浸漬することにより現像した。さらに、２０
℃のジオキサン中に５秒間浸漬し、水洗、乾燥し九とこ
ろ透明で均一なレリーフホログラムが得られ１回折効率
は１０．６％であった。A two-beam interference optical system was assembled using an air-cooled Alden laser as an output source, the hologram image forming material was set in a dry plate holder, and radar exposure was performed for 15 seconds. After irradiation, the photosensitive layer was developed by immersing it in an aqueous alkaline developer at 20° C. for 30 seconds. In addition, 20
It was immersed in dioxane at a temperature of 0.degree. C. for 5 seconds, washed with water, and dried to obtain a transparent and uniform relief hologram with a single diffraction efficiency of 10.6%.
実施例２
実施例１で得られた未露光のホログラム画像形成用材料
を６０℃７５％ＲＨの恒温恒湿器に３日間貯蔵した。Example 2 The unexposed hologram image forming material obtained in Example 1 was stored in a constant temperature and humidity chamber at 60° C. and 75% RH for 3 days.
この促進疲労し次ホログラム画像形成用材料を実施例１
と同様にして、二光束干渉系によってレーザー露光した
。照射後、実施例１と同様に、現像処理し九ところ、透
明で均一なレリーフホログラムが得られ、その回折効率
は１０．２％であり九。After this accelerated fatigue, the following hologram image forming material was prepared in Example 1.
Laser exposure was performed using a two-beam interference system in the same manner as above. After irradiation, development was performed in the same manner as in Example 1, and a transparent and uniform relief hologram was obtained, with a diffraction efficiency of 10.2%.
この６０℃７５％ＲＨ条件下での３日間の貯蔵は、常温
における約３年の貯蔵期間に相当するものと考えられ、
本発明のホログラム画像形成用材料は、十分な保存安定
性を有するものと判断できる。It is thought that storage for 3 days at 60°C and 75% RH corresponds to a storage period of about 3 years at room temperature.
It can be judged that the hologram image forming material of the present invention has sufficient storage stability.
実施例３
実施例１で調合した感光性樹脂溶液を、ロールコーター
ヲ用いて、ポリヵ゛−デネートフィルム（１２５ｍ厚）
上に塗布し、１００’Ｃで３０分間熱処理して、フォト
レジスト層の厚さ０．７μｍのホログラム画像形成用材
料を得た。Example 3 The photosensitive resin solution prepared in Example 1 was coated on a polycarbonate film (125 m thick) using a roll coater.
The photoresist layer was coated on top and heat treated at 100'C for 30 minutes to obtain a holographic image forming material with a photoresist layer thickness of 0.7 μm.
実施例１と同様にして、二光束干渉系によって１０秒間
レーザー照射した後、感光層を゛ジオキサン５部とイン
グ四♂ルアルコール３５部かう成る２０℃の混合溶媒中
に、１５秒間浸漬し九。次かで、１００℃で１分間乾燥
し、室温にて放冷し喪後、感光層を２０℃の水性アルカ
リ現＠箪に１５秒間浸漬することにより現像し念。さら
に、この感光層を２０℃のジオキサン中に１０秒間浸漬
し、水洗、乾燥したところ透明なレリーフホログラムが
得られ、その回折効率は１１．３％であった。After laser irradiation for 10 seconds using a two-beam interference system in the same manner as in Example 1, the photosensitive layer was immersed for 15 seconds in a mixed solvent of 5 parts of dioxane and 35 parts of alcohol at 20°C. . Next, the photosensitive layer was dried at 100° C. for 1 minute, left to cool at room temperature, and developed by immersing the photosensitive layer in an aqueous alkaline developer at 20° C. for 15 seconds. Further, this photosensitive layer was immersed in dioxane at 20° C. for 10 seconds, washed with water, and dried to obtain a transparent relief hologram with a diffraction efficiency of 11.3%.
実施例４
実藁例３で得られ九未露光のホログラム画像形成材料を
６０℃７５％ＲＨの恒温恒温器に３日間貯蔵し念。Example 4 The unexposed hologram image forming material obtained in Example 3 was stored in a constant temperature incubator at 60° C. and 75% RH for 3 days.
この促進疲労したホログラム画像形成材料を実゛施例３
と同様にして、二光束干渉系によってレーザー露光した
。照射後、実施例３と同様に、現像処理したとζろ、透
明で均一なレリーフホログラムが得られ、その回折効率
は１０．８％であり九。Example 3 This accelerated fatigued hologram imaging material
Laser exposure was performed using a two-beam interference system in the same manner as above. After irradiation, development was performed in the same manner as in Example 3, and a transparent and uniform relief hologram was obtained, with a diffraction efficiency of 10.8%.
〔発明の効果〕
本発明のホログラム画像形成用材料は、一定品質であり
、長期間にわ九る貯蔵安定性にも優れているので安定し
次しリーフホ四グラムを形成することができる。また、
感光層の材料としてネガ型感光性組成物を使用している
ので、露光時間を短縮でき、その結果、レリーフホログ
ラムの作製効率を上昇させることができる。[Effects of the Invention] The hologram image forming material of the present invention has a constant quality and is excellent in storage stability over a long period of time, so that it is stable and can form a leaf photogram. Also,
Since a negative photosensitive composition is used as the material for the photosensitive layer, the exposure time can be shortened, and as a result, the production efficiency of relief holograms can be increased.
代理人弁理士 高 橋 勝 利
手続補正書
昭和６２年１１月ＩＪ日
特許庁長官 小 川 邦 夫 殿
１、事件の表示
昭和６１年特許願第３０７７５３号
２、発明の名称
ホログラム画像形成用材料
３、補正をする者
事件との関係 特許出頭人
〒１７４東京都板橋区坂下三丁目３５番５８号（２８８
）大日本イン中化学工業株式会社代表者 用 村
茂 邦
４、代 理 人
〒１０３東京都中央区日本橋三丁目７番２０号大日本イ
ンキ化学工業株式会社内４、−：’ｌ：”３ ｉ’：。Patent attorney Katsutoshi Takahashi Procedural amendment November 1988 IJ Director General of the Patent Office Kunio Ogawa 1, Indication of the case Patent application No. 307753 filed in 1985 2, Name of the invention Holographic image forming material 3 , Relationship with the case of the person making the amendment Patent applicant: 3-35-58 Sakashita, Itabashi-ku, Tokyo 174 (288
) Dainippon Ink Chemical Industries Co., Ltd. Representative Shigeru Kuni Mura 4, Agent 4, Dainippon Ink Chemical Industries Co., Ltd. 3-7-20 Nihonbashi, Chuo-ku, Tokyo 103, -:'l:”3 i':.
電話 東京（０３） ２７２−４５１１ （大代表）
ト・ｊ、、（：１（８８７６）弁理士 高 橋
勝 利゛−′°゛５、補正の対像
−
６、補正の内容
（１） 明細書第４頁第１４行目と第１５行目との行
間に次の文章を挿入する。Telephone Tokyo (03) 272-4511 (main representative)
t.j., (:1 (8876) Patent attorney Takahashi
Victory ゛−′°゛5, contrast of correction
- 6. Contents of amendment (1) The following sentence is inserted between the 14th line and the 15th line of page 4 of the specification.
ｒ本発明で用いることのできるネガ型感光性組成物とし
ては、例えば、ジアゾニクム塩類を感光基とするジアゾ
樹脂；アット基を感光基とする感光性樹脂；フェニレン
ジアクリル酸基を感光基とする感光性樹脂；ポリケイ皮
酸ビニル、ポリビニロキシエチルシンナメート、ポリ（
メタ）アクリロ命ジエチルシンナメート、４リグリシジ
ルシンナメートの如きケイ皮酸基とする感光性樹脂；ｐ
−フェニレンジアクリル［ｍ−フェニレンジアクリル酸
、２，５−ジメト會シーｐ−フェニレンジアクリル酸、
２−ニトロ−ｐ−フェニレンジアクリル酸、ｐ−カル♂
キシケイ皮酸、シンナミリデンｉロン酸、ビス（ｐ−ケ
イ皮酸）ジエチレングリコールエーテル、ビス（ｐ−カ
ルがキシペンデルコシクロヘキサノン、ビス（ｐ−カル
？キシペンデル）シクロペンタノン、ｐｌｐ′−力ルコ
ンジカルゴン酸等のジカルボン酸又はその誘導体と多価
アルコールとの重縮合反応により得られる不飽和ポリエ
ステル系感光性樹脂等が挙げられるが、フェニレンジア
クリレート基及び／又はケイ皮酸基金主鎖もしくは側鎖
に含有する重合体を主成分とする水性アルカリ現像液で
現像可能な感光性組成物が好ましい。」
（２］ 明細書第６頁第１３行目における「シクロヘ
キサン」を
ｒシクロヘキサノン」に
補正する。r Negative photosensitive compositions that can be used in the present invention include, for example, diazo resins having a diazonicum salt as a photosensitive group; photosensitive resins having an at group as a photosensitive group; and photosensitive resins having a phenylene diacrylic acid group as a photosensitive group. Photosensitive resin; polyvinyl cinnamate, polyvinyloxyethyl cinnamate, poly(
meth) Photosensitive resins with cinnamic acid groups such as acrylic diethyl cinnamate and 4-liglycidyl cinnamate; p
-phenylene diacrylic [m-phenylene diacrylic acid, 2,5-dimethacrylate p-phenylene diacrylic acid,
2-nitro-p-phenylene diacrylic acid, p-cal♂
Xycinnamic acid, cinnamylidene ironic acid, bis(p-cinnamic acid) diethylene glycol ether, bis(p-carxypendelcocyclohexanone, bis(p-calxypendel)cyclopentanone, plp'-rucondicalgonic acid, etc. Examples include unsaturated polyester photosensitive resins obtained by the polycondensation reaction of dicarboxylic acids or derivatives thereof and polyhydric alcohols, which contain phenylene diacrylate groups and/or cinnamic acid groups in the main chain or side chain. A photosensitive composition that can be developed with an aqueous alkaline developer containing a polymer as a main component is preferred.'' (2) Correct ``cyclohexane'' in line 13 of page 6 of the specification to ``rcyclohexanone''.
以 上that's all
Claims (1)
型感光性組成物より成る感光層を形成して成るホログラ
ム画像形成用材料。 ２、プラスチックシートが、その一方の面にハレーショ
ン防止層を有することを特徴とする特許請求の範囲第１
項記載のホログラム画像形成用材料。 ３、感光性組成物が、フェニレンジアクリレート基及び
／又はケイ皮酸基を主鎖もしくは側鎖に含有する重合体
を主成分とする水性アルカリ現像液で現像可能な感光性
組成物であることを特徴とする特許請求の範囲第１項及
び第２項記載のホログラム画像形成用材料。[Claims] 1. A holographic image forming material comprising a photosensitive layer made of a negative photosensitive composition formed on a transparent or translucent plastic sheet. 2. Claim 1, characterized in that the plastic sheet has an antihalation layer on one side thereof.
The holographic image forming material described in . 3. The photosensitive composition is a photosensitive composition that can be developed with an aqueous alkaline developer whose main component is a polymer containing a phenylene diacrylate group and/or a cinnamic acid group in the main chain or side chain. A holographic image forming material according to claims 1 and 2, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30775386A JPS63161444A (en) | 1986-12-25 | 1986-12-25 | Hologram image forming material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30775386A JPS63161444A (en) | 1986-12-25 | 1986-12-25 | Hologram image forming material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63161444A true JPS63161444A (en) | 1988-07-05 |
Family
ID=17972855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30775386A Pending JPS63161444A (en) | 1986-12-25 | 1986-12-25 | Hologram image forming material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63161444A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11561507B2 (en) | 2018-04-17 | 2023-01-24 | Meta Platforms Technologies, Llc | Methods for three-dimensional arrangement of anisotropic molecules, patterned anisotropic films, and optical elements therewith |
| US12092850B2 (en) | 2018-04-17 | 2024-09-17 | Meta Platforms Technologies, Llc | Patterned anisotropic films and optical elements therewith |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51119227A (en) * | 1975-04-02 | 1976-10-19 | Hitachi Ltd | Method of preparing an uneven image formation |
| JPS60165646A (en) * | 1984-02-09 | 1985-08-28 | Dainippon Ink & Chem Inc | Photosensitive image forming material developable with aqueous alkaline developing solution |
| JPS61238079A (en) * | 1985-04-15 | 1986-10-23 | Dainippon Printing Co Ltd | Colored hologram sheet |
-
1986
- 1986-12-25 JP JP30775386A patent/JPS63161444A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51119227A (en) * | 1975-04-02 | 1976-10-19 | Hitachi Ltd | Method of preparing an uneven image formation |
| JPS60165646A (en) * | 1984-02-09 | 1985-08-28 | Dainippon Ink & Chem Inc | Photosensitive image forming material developable with aqueous alkaline developing solution |
| JPS61238079A (en) * | 1985-04-15 | 1986-10-23 | Dainippon Printing Co Ltd | Colored hologram sheet |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11561507B2 (en) | 2018-04-17 | 2023-01-24 | Meta Platforms Technologies, Llc | Methods for three-dimensional arrangement of anisotropic molecules, patterned anisotropic films, and optical elements therewith |
| US12092850B2 (en) | 2018-04-17 | 2024-09-17 | Meta Platforms Technologies, Llc | Patterned anisotropic films and optical elements therewith |
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