JPS56104480A - Manufacture of infrared detector - Google Patents
Manufacture of infrared detectorInfo
- Publication number
- JPS56104480A JPS56104480A JP720580A JP720580A JPS56104480A JP S56104480 A JPS56104480 A JP S56104480A JP 720580 A JP720580 A JP 720580A JP 720580 A JP720580 A JP 720580A JP S56104480 A JPS56104480 A JP S56104480A
- Authority
- JP
- Japan
- Prior art keywords
- region
- infrared
- film
- infrared rays
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004020 conductor Substances 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN homojunction type
- H01L31/1035—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIIBV compounds
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To prevent the reflection of the infrared rays of the infrared detector and to obtain high resolution thereof by forming beforehand an electrode forming region and a ray receiving region, bonding a conductor to the electrode forming region and then forming an insulating film and a film which does not pass the infrared rays. CONSTITUTION:After a P type layer 2 is formed on an InSb substrate, the infrared detecting region formed of an infrared ray receiving region and the electrode forming region 4 is formed thereon. After a gold wire 7 is then bonded to the region 4, a mesa top formed of the infrared receiving region and the region 4 is etched to that the carrier produced due to the infrared rays may readily reach the P-N junction. After the insulating film 8 is evaporated, the film 9 for covering the region 4 and the periphery thereof not to pass the infrared rays is covered thereon. Further, an electrode film 10 is formed to complete the infrared detector.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP720580A JPS56104480A (en) | 1980-01-23 | 1980-01-23 | Manufacture of infrared detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP720580A JPS56104480A (en) | 1980-01-23 | 1980-01-23 | Manufacture of infrared detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56104480A true JPS56104480A (en) | 1981-08-20 |
Family
ID=11659512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP720580A Pending JPS56104480A (en) | 1980-01-23 | 1980-01-23 | Manufacture of infrared detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56104480A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0286177A (en) * | 1988-09-22 | 1990-03-27 | Fujitsu Ltd | Photoelectric converter |
-
1980
- 1980-01-23 JP JP720580A patent/JPS56104480A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0286177A (en) * | 1988-09-22 | 1990-03-27 | Fujitsu Ltd | Photoelectric converter |
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