JPS5582451A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5582451A JPS5582451A JP15513478A JP15513478A JPS5582451A JP S5582451 A JPS5582451 A JP S5582451A JP 15513478 A JP15513478 A JP 15513478A JP 15513478 A JP15513478 A JP 15513478A JP S5582451 A JPS5582451 A JP S5582451A
- Authority
- JP
- Japan
- Prior art keywords
- coated
- oxide film
- insulating film
- layer
- manufactured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15513478A JPS5582451A (en) | 1978-12-14 | 1978-12-14 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15513478A JPS5582451A (en) | 1978-12-14 | 1978-12-14 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5582451A true JPS5582451A (en) | 1980-06-21 |
| JPS6129144B2 JPS6129144B2 (enrdf_load_stackoverflow) | 1986-07-04 |
Family
ID=15599289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15513478A Granted JPS5582451A (en) | 1978-12-14 | 1978-12-14 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5582451A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57204174A (en) * | 1981-06-09 | 1982-12-14 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS6052059A (ja) * | 1983-08-31 | 1985-03-23 | Toshiba Corp | 半導体装置の製造方法 |
| US5077229A (en) * | 1988-10-10 | 1991-12-31 | Eniricerche S.P.A. | Monolithic chemical sensor of the chemfet type incorporating an ion-selective membrane and method of making the same |
-
1978
- 1978-12-14 JP JP15513478A patent/JPS5582451A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57204174A (en) * | 1981-06-09 | 1982-12-14 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS6052059A (ja) * | 1983-08-31 | 1985-03-23 | Toshiba Corp | 半導体装置の製造方法 |
| US5077229A (en) * | 1988-10-10 | 1991-12-31 | Eniricerche S.P.A. | Monolithic chemical sensor of the chemfet type incorporating an ion-selective membrane and method of making the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6129144B2 (enrdf_load_stackoverflow) | 1986-07-04 |
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