JPS5576347A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5576347A
JPS5576347A JP14936178A JP14936178A JPS5576347A JP S5576347 A JPS5576347 A JP S5576347A JP 14936178 A JP14936178 A JP 14936178A JP 14936178 A JP14936178 A JP 14936178A JP S5576347 A JPS5576347 A JP S5576347A
Authority
JP
Japan
Prior art keywords
mask
film
silicon oxide
mentioned
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14936178A
Other languages
Japanese (ja)
Inventor
Masaru Nakamura
Kazuhiro Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14936178A priority Critical patent/JPS5576347A/en
Publication of JPS5576347A publication Critical patent/JPS5576347A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Abstract

PURPOSE:To enhance the cleaning effect of the photo mask and achieve the increase in the number of use times by covering the surface for forming photo mask patterns with the coating film of silicon oxide and using the mask. CONSTITUTION:A coating film 3 of silicon oxide is provided over the entire surface of a glass substrate 1 formed with mask patterns 2. The above-mentioned film 3 is formed as a transparent film of thicknesses 0.1-0.2mu by coating the liquid-form one normally called ''silica film'' (e.g., O.C.D. made by Tokyo Oka Kogyo K.K.). When stains have deposited on the mask surface through the use of the above- mentioned mask and repetition of photo resist pattern formation on semiconductor device substrates, the photo mask is cleaned with, e.g., a dilute hydrofluoric acid solution to etch away the above-mentioned silicon oxide film and also strip away the stains, thence the coating film of the silicon oxide is again deposited, thus it is used as the mask of a clean pattern surface.
JP14936178A 1978-12-01 1978-12-01 Photo mask Pending JPS5576347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14936178A JPS5576347A (en) 1978-12-01 1978-12-01 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14936178A JPS5576347A (en) 1978-12-01 1978-12-01 Photo mask

Publications (1)

Publication Number Publication Date
JPS5576347A true JPS5576347A (en) 1980-06-09

Family

ID=15473444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14936178A Pending JPS5576347A (en) 1978-12-01 1978-12-01 Photo mask

Country Status (1)

Country Link
JP (1) JPS5576347A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1677342A1 (en) * 2004-12-31 2006-07-05 Altis Semiconductor Process for cleaning a semiconductor wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1677342A1 (en) * 2004-12-31 2006-07-05 Altis Semiconductor Process for cleaning a semiconductor wafer
FR2880471A1 (en) * 2004-12-31 2006-07-07 Altis Semiconductor Snc METHOD FOR CLEANING A SEMICONDUCTOR

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