JPS57202506A - Optical circuit and its production - Google Patents
Optical circuit and its productionInfo
- Publication number
- JPS57202506A JPS57202506A JP8737081A JP8737081A JPS57202506A JP S57202506 A JPS57202506 A JP S57202506A JP 8737081 A JP8737081 A JP 8737081A JP 8737081 A JP8737081 A JP 8737081A JP S57202506 A JPS57202506 A JP S57202506A
- Authority
- JP
- Japan
- Prior art keywords
- waveguides
- sio2
- optical fibers
- silicon substrate
- high accuracy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/30—Optical coupling means for use between fibre and thin-film device
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
- Mechanical Coupling Of Light Guides (AREA)
Abstract
PURPOSE:To facilitate connection to optical fibers with high accuracy by forming optical waveguides of prescribed patterns on a silicon substrate and grooves for holding optical fibers on the common lines thereof. CONSTITUTION:An SiO2 film 2 as a clad layer is formed on the (100) plane of a silicon substrate 1, and a vitreous layer 3 of the composition GeO2-P2O5-TiO2- SiO2 is deposited thereon by a plasma CVD method. The core glass 3 is patterned by a plasma etching method and a surface clad layer 5 is provided therein by a plasma CVD method, whereby waveguides 7 are formed. Photoresist is coated over the entire surace and is exposed to UV rays by using a mask having prescribed patterns, after which the resist is developed. The exposed parts of the SiO2 are etched by a buffer hydrofluoric acid to remove the photoresist film, and V-shaped grooves 6 are formed by anisotropic etching using an aq. 30% KOH soln. In this way, the connection of optical fibers 8 and the waveguides 7 with high accuracy is facilitated by this.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8737081A JPS57202506A (en) | 1981-06-06 | 1981-06-06 | Optical circuit and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8737081A JPS57202506A (en) | 1981-06-06 | 1981-06-06 | Optical circuit and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57202506A true JPS57202506A (en) | 1982-12-11 |
Family
ID=13913004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8737081A Pending JPS57202506A (en) | 1981-06-06 | 1981-06-06 | Optical circuit and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57202506A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0171615A2 (en) * | 1984-08-10 | 1986-02-19 | Nippon Telegraph and Telephone Corporation | Hybrid optical integrated circuit and fabrication method thereof |
JPS61284704A (en) * | 1985-06-11 | 1986-12-15 | Sumitomo Electric Ind Ltd | Multi-layered glass film for quartz optical waveguide and its production |
JPS62124511A (en) * | 1985-11-25 | 1987-06-05 | Nippon Telegr & Teleph Corp <Ntt> | Preparation of silicon wafer having optical waveguide film |
JPS62288802A (en) * | 1986-06-09 | 1987-12-15 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of quartz optical waveguide |
JPH01229207A (en) * | 1988-03-03 | 1989-09-12 | American Teleph & Telegr Co <Att> | Optical fiber connector and manufacture thereof |
JPH01291204A (en) * | 1988-05-18 | 1989-11-22 | Furukawa Electric Co Ltd:The | Method of connecting waveguide |
JPH0271203A (en) * | 1988-03-03 | 1990-03-09 | American Teleph & Telegr Co <Att> | Device having optical guide body supported by substrate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5598707A (en) * | 1979-01-22 | 1980-07-28 | Oki Electric Ind Co Ltd | Forming method of glass thick film light circuit |
JPS5642204A (en) * | 1979-09-14 | 1981-04-20 | Fujitsu Ltd | Production of photocircuit |
-
1981
- 1981-06-06 JP JP8737081A patent/JPS57202506A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5598707A (en) * | 1979-01-22 | 1980-07-28 | Oki Electric Ind Co Ltd | Forming method of glass thick film light circuit |
JPS5642204A (en) * | 1979-09-14 | 1981-04-20 | Fujitsu Ltd | Production of photocircuit |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0171615A2 (en) * | 1984-08-10 | 1986-02-19 | Nippon Telegraph and Telephone Corporation | Hybrid optical integrated circuit and fabrication method thereof |
JPS61284704A (en) * | 1985-06-11 | 1986-12-15 | Sumitomo Electric Ind Ltd | Multi-layered glass film for quartz optical waveguide and its production |
JPS62124511A (en) * | 1985-11-25 | 1987-06-05 | Nippon Telegr & Teleph Corp <Ntt> | Preparation of silicon wafer having optical waveguide film |
JPS62288802A (en) * | 1986-06-09 | 1987-12-15 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of quartz optical waveguide |
JPH01229207A (en) * | 1988-03-03 | 1989-09-12 | American Teleph & Telegr Co <Att> | Optical fiber connector and manufacture thereof |
JPH0271203A (en) * | 1988-03-03 | 1990-03-09 | American Teleph & Telegr Co <Att> | Device having optical guide body supported by substrate |
JPH01291204A (en) * | 1988-05-18 | 1989-11-22 | Furukawa Electric Co Ltd:The | Method of connecting waveguide |
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