JPS5575405A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPS5575405A JPS5575405A JP14852378A JP14852378A JPS5575405A JP S5575405 A JPS5575405 A JP S5575405A JP 14852378 A JP14852378 A JP 14852378A JP 14852378 A JP14852378 A JP 14852378A JP S5575405 A JPS5575405 A JP S5575405A
- Authority
- JP
- Japan
- Prior art keywords
- photopolymerization initiator
- compound
- substed
- compounded
- aromatic ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14852378A JPS5575405A (en) | 1978-11-30 | 1978-11-30 | Photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14852378A JPS5575405A (en) | 1978-11-30 | 1978-11-30 | Photopolymerizable composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5575405A true JPS5575405A (en) | 1980-06-06 |
JPS6333481B2 JPS6333481B2 (ja) | 1988-07-05 |
Family
ID=15454672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14852378A Granted JPS5575405A (en) | 1978-11-30 | 1978-11-30 | Photopolymerizable composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5575405A (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5971048A (ja) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
US5221595A (en) * | 1990-03-27 | 1993-06-22 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material prepared therefrom |
JPH05245984A (ja) * | 1992-03-05 | 1993-09-24 | Hitachi Chem Co Ltd | 電気用積層板 |
WO2006126480A1 (ja) * | 2005-05-23 | 2006-11-30 | Hitachi Chemical Company, Ltd. | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP2007004138A (ja) * | 2005-05-23 | 2007-01-11 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP2007101940A (ja) * | 2005-10-05 | 2007-04-19 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物及び積層体 |
JP2007279381A (ja) * | 2006-04-06 | 2007-10-25 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JPWO2007010614A1 (ja) * | 2005-07-22 | 2009-01-29 | 旭化成エレクトロニクス株式会社 | 感光性樹脂組成物及び積層体 |
JP2010198027A (ja) * | 2010-04-01 | 2010-09-09 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
-
1978
- 1978-11-30 JP JP14852378A patent/JPS5575405A/ja active Granted
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5971048A (ja) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
JPH0469381B2 (ja) * | 1982-10-18 | 1992-11-06 | Mitsubishi Chem Ind | |
US5221595A (en) * | 1990-03-27 | 1993-06-22 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material prepared therefrom |
JPH05245984A (ja) * | 1992-03-05 | 1993-09-24 | Hitachi Chem Co Ltd | 電気用積層板 |
CN104133343B (zh) * | 2005-05-23 | 2016-11-16 | 日立化成株式会社 | 感光性树脂组合物,感光性元件,光致抗蚀图形的形成方法及印刷电路板的制造方法 |
JP2007004138A (ja) * | 2005-05-23 | 2007-01-11 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
US7993809B2 (en) | 2005-05-23 | 2011-08-09 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
CN104133343A (zh) * | 2005-05-23 | 2014-11-05 | 日立化成工业株式会社 | 感光性树脂组合物,感光性元件,光致抗蚀图形的形成方法及印刷电路板的制造方法 |
WO2006126480A1 (ja) * | 2005-05-23 | 2006-11-30 | Hitachi Chemical Company, Ltd. | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
KR100935779B1 (ko) | 2005-05-23 | 2010-01-06 | 히다치 가세고교 가부시끼가이샤 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의형성방법 및 프린트 배선판의 제조방법 |
KR100953245B1 (ko) * | 2005-05-23 | 2010-04-16 | 히다치 가세고교 가부시끼가이샤 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성방법 및 프린트 배선판의 제조방법 |
US8198008B2 (en) | 2005-05-23 | 2012-06-12 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
US8192916B2 (en) | 2005-05-23 | 2012-06-05 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
JPWO2007010614A1 (ja) * | 2005-07-22 | 2009-01-29 | 旭化成エレクトロニクス株式会社 | 感光性樹脂組成物及び積層体 |
JP4642076B2 (ja) * | 2005-07-22 | 2011-03-02 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
JP2007101940A (ja) * | 2005-10-05 | 2007-04-19 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物及び積層体 |
JP4525626B2 (ja) * | 2006-04-06 | 2010-08-18 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP2007279381A (ja) * | 2006-04-06 | 2007-10-25 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP2010198027A (ja) * | 2010-04-01 | 2010-09-09 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6333481B2 (ja) | 1988-07-05 |
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