JPS5563852A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5563852A JPS5563852A JP13818078A JP13818078A JPS5563852A JP S5563852 A JPS5563852 A JP S5563852A JP 13818078 A JP13818078 A JP 13818078A JP 13818078 A JP13818078 A JP 13818078A JP S5563852 A JPS5563852 A JP S5563852A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- barrier metal
- coated
- salient
- piq
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
PURPOSE: To perform firm bonding and raise the reliability, by coating a high- molecular insulating protective film on the exposed part of a barrier metal interposed between a salient electrode and an electrode pad.
CONSTITUTION: A resist is so coated on the surface of a semiconductor substrate 11 provided with an aluminium electrode pad 13 that the pad is exposed. A barrier metal layer 15 of Cr-Cu-Au or the like is then evaporated. A salient electrode 16 is manufactured by electrolytic plating of gold as the barrier metal layer 15 covering the electrode pad 13 is left. After an unnecessary part of the barrier metal layer is removed, a high-molecular insulating proptective film is coated. A coupling agent and a PIQ 14 are coated and heated. A resist is so provided that the PIQ 14 is exposed at the salient electrode 16. Etching is performed to expose the electrode 16. Unnecessary parts of the resist and the coupling agent are removed. A high-molecular insulating protective film is coated on the region of the barrier metal off its part coupled with the salient electrode. This results in effecting firm bonding and raising the reliability despite the etching of the PIQ.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13818078A JPS5563852A (en) | 1978-11-08 | 1978-11-08 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13818078A JPS5563852A (en) | 1978-11-08 | 1978-11-08 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5563852A true JPS5563852A (en) | 1980-05-14 |
Family
ID=15215914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13818078A Pending JPS5563852A (en) | 1978-11-08 | 1978-11-08 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5563852A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136049A (en) * | 1985-12-10 | 1987-06-19 | Fuji Electric Co Ltd | Manufacture of semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4874184A (en) * | 1971-12-29 | 1973-10-05 | ||
JPS51122375A (en) * | 1975-04-09 | 1976-10-26 | Nec Corp | Semiconductor device |
-
1978
- 1978-11-08 JP JP13818078A patent/JPS5563852A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4874184A (en) * | 1971-12-29 | 1973-10-05 | ||
JPS51122375A (en) * | 1975-04-09 | 1976-10-26 | Nec Corp | Semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62136049A (en) * | 1985-12-10 | 1987-06-19 | Fuji Electric Co Ltd | Manufacture of semiconductor device |
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