JPS556210B2 - - Google Patents

Info

Publication number
JPS556210B2
JPS556210B2 JP4875075A JP4875075A JPS556210B2 JP S556210 B2 JPS556210 B2 JP S556210B2 JP 4875075 A JP4875075 A JP 4875075A JP 4875075 A JP4875075 A JP 4875075A JP S556210 B2 JPS556210 B2 JP S556210B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4875075A
Other languages
Japanese (ja)
Other versions
JPS50147323A (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50147323A publication Critical patent/JPS50147323A/ja
Publication of JPS556210B2 publication Critical patent/JPS556210B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP4875075A 1974-04-23 1975-04-23 Expired JPS556210B2 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (2)

Publication Number Publication Date
JPS50147323A JPS50147323A (cs) 1975-11-26
JPS556210B2 true JPS556210B2 (cs) 1980-02-14

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4875075A Expired JPS556210B2 (cs) 1974-04-23 1975-04-23

Country Status (6)

Country Link
JP (1) JPS556210B2 (cs)
BE (1) BE828237A (cs)
CA (1) CA1056189A (cs)
DE (1) DE2517656B2 (cs)
FR (1) FR2269108B1 (cs)
GB (1) GB1507704A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05241340A (ja) * 1992-02-26 1993-09-21 Fuji Photo Film Co Ltd 光重合性組成物

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
DE2812016A1 (de) * 1977-03-22 1978-09-28 Du Pont Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
DE3814566C1 (cs) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
WO2015117100A1 (en) 2014-02-02 2015-08-06 Molaire Consulting Llc Noncrystallizable sensitized layers for oled and oeds

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (cs) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
DE2064080C3 (de) * 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702C3 (de) * 1971-05-13 1988-05-26 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05241340A (ja) * 1992-02-26 1993-09-21 Fuji Photo Film Co Ltd 光重合性組成物

Also Published As

Publication number Publication date
CA1056189A (en) 1979-06-12
BE828237A (fr) 1975-10-22
FR2269108A1 (cs) 1975-11-21
GB1507704A (en) 1978-04-19
DE2517656B2 (de) 1980-11-13
FR2269108B1 (cs) 1981-10-30
JPS50147323A (cs) 1975-11-26
DE2517656A1 (de) 1975-10-30

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