JPS5559456A - Electron beam recording method - Google Patents

Electron beam recording method

Info

Publication number
JPS5559456A
JPS5559456A JP13192878A JP13192878A JPS5559456A JP S5559456 A JPS5559456 A JP S5559456A JP 13192878 A JP13192878 A JP 13192878A JP 13192878 A JP13192878 A JP 13192878A JP S5559456 A JPS5559456 A JP S5559456A
Authority
JP
Japan
Prior art keywords
electron beam
quinonediazide
photosensitive layer
incorporated
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13192878A
Other languages
English (en)
Other versions
JPS6131859B2 (ja
Inventor
Yonosuke Takahashi
Hiromichi Tachikawa
Fumiaki Shinozaki
Tomoaki Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP13192878A priority Critical patent/JPS5559456A/ja
Publication of JPS5559456A publication Critical patent/JPS5559456A/ja
Publication of JPS6131859B2 publication Critical patent/JPS6131859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP13192878A 1978-10-25 1978-10-25 Electron beam recording method Granted JPS5559456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13192878A JPS5559456A (en) 1978-10-25 1978-10-25 Electron beam recording method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13192878A JPS5559456A (en) 1978-10-25 1978-10-25 Electron beam recording method

Publications (2)

Publication Number Publication Date
JPS5559456A true JPS5559456A (en) 1980-05-02
JPS6131859B2 JPS6131859B2 (ja) 1986-07-23

Family

ID=15069475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13192878A Granted JPS5559456A (en) 1978-10-25 1978-10-25 Electron beam recording method

Country Status (1)

Country Link
JP (1) JPS5559456A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0182587A2 (en) * 1984-11-16 1986-05-28 International Business Machines Corporation A photo resist and a process for manufacturing an integrated circuit
JPS6435438A (en) * 1987-07-01 1989-02-06 Ciba Geigy Ag Image formation
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0182587A2 (en) * 1984-11-16 1986-05-28 International Business Machines Corporation A photo resist and a process for manufacturing an integrated circuit
JPS6435438A (en) * 1987-07-01 1989-02-06 Ciba Geigy Ag Image formation
JPS6478249A (en) * 1987-09-18 1989-03-23 Fuji Photo Film Co Ltd Photosensitive material and image forming method

Also Published As

Publication number Publication date
JPS6131859B2 (ja) 1986-07-23

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