ES515330A0 - Un procedimiento para el revelado de capas de reproduccion foto-sensibles expuestas. - Google Patents

Un procedimiento para el revelado de capas de reproduccion foto-sensibles expuestas.

Info

Publication number
ES515330A0
ES515330A0 ES515330A ES515330A ES515330A0 ES 515330 A0 ES515330 A0 ES 515330A0 ES 515330 A ES515330 A ES 515330A ES 515330 A ES515330 A ES 515330A ES 515330 A0 ES515330 A0 ES 515330A0
Authority
ES
Spain
Prior art keywords
development
procedure
reproduction layers
sensitive reproduction
exposed photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES515330A
Other languages
English (en)
Other versions
ES8306889A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES515330A0 publication Critical patent/ES515330A0/es
Publication of ES8306889A1 publication Critical patent/ES8306889A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3007—Imagewise removal using liquid means combined with electrical means, e.g. force fields
ES515330A 1981-08-28 1982-08-27 Un procedimiento para el revelado de capas de reproduccion foto-sensibles expuestas. Expired ES8306889A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813134054 DE3134054A1 (de) 1981-08-28 1981-08-28 Elektrochemisches entwicklungsverfahren fuer reproduktionsschichten

Publications (2)

Publication Number Publication Date
ES515330A0 true ES515330A0 (es) 1983-06-01
ES8306889A1 ES8306889A1 (es) 1983-06-01

Family

ID=6140325

Family Applications (1)

Application Number Title Priority Date Filing Date
ES515330A Expired ES8306889A1 (es) 1981-08-28 1982-08-27 Un procedimiento para el revelado de capas de reproduccion foto-sensibles expuestas.

Country Status (11)

Country Link
US (1) US4549944A (es)
EP (1) EP0073445B1 (es)
JP (1) JPS5842042A (es)
AT (1) ATE20394T1 (es)
AU (1) AU8754382A (es)
BR (1) BR8205025A (es)
CA (1) CA1189378A (es)
DE (2) DE3134054A1 (es)
ES (1) ES8306889A1 (es)
FI (1) FI822965L (es)
ZA (1) ZA825879B (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06103393B2 (ja) * 1985-01-21 1994-12-14 シグマ技術工業株式会社 現像の終点検出方法
JPS6120043A (ja) * 1984-07-09 1986-01-28 Sigma Gijutsu Kogyo Kk 現像の終点検出方法
JP2509572B2 (ja) * 1985-08-19 1996-06-19 株式会社東芝 パタ−ン形成方法及び装置
JPH0342705U (es) * 1989-08-29 1991-04-23
US5183725A (en) * 1989-10-03 1993-02-02 Sharp Kabushiki Kaisha Electrode pattern forming method
KR970000235B1 (ko) * 1992-01-28 1997-01-08 마쯔다 가부시기가이샤 차량의 서스펜션장치
JP2598879B2 (ja) * 1993-12-20 1997-04-09 オリヒロ株式会社 竪型充填包装機
US6238810B1 (en) * 1999-04-07 2001-05-29 Pacesetter, Inc. Process for using surface active agents to produce high etch gains for electrolytic capacitor manufacturing
US6468413B1 (en) * 2000-10-26 2002-10-22 International Business Machines Corporation Electrochemical etch for high tin solder bumps
US6896143B2 (en) * 2001-07-27 2005-05-24 Sankyo Seiki Mfg. Co., Ltd. Electrolytic machining method, method for manufacturing dynamic pressure bearing devices, and dynamic pressure bearing devices manufactured according to the manufacturing method
JP4607521B2 (ja) * 2004-08-25 2011-01-05 コダック株式会社 平版印刷版原版の現像処理方法及び装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US909831A (en) * 1906-12-13 1909-01-12 Hans Strecker-Aufermann Process for preparing printing-plates by means of electrolytic etching.
US1579898A (en) * 1925-02-11 1926-04-06 Star Company Photographically-sensitive resist compound
US1892099A (en) * 1931-03-03 1932-12-27 Forbes Lithograph Mfg Co Modifying photographic images
US2117294A (en) * 1936-03-11 1938-05-17 John J Buchser Electrolytic film removing apparatus
US2541488A (en) * 1946-03-14 1951-02-13 Eastman Kodak Co Electrolytic diazo process
US2480845A (en) * 1947-03-14 1949-09-06 Frager Max Electrolytic removal of resin from metal
US3149059A (en) * 1960-04-06 1964-09-15 Minnesota Mining & Mfg Reproduction process
US3284199A (en) * 1963-05-02 1966-11-08 Du Pont Buffered stop bath for interrupted photographic development
US4023898A (en) * 1972-03-10 1977-05-17 Research And Development Laboratories Of Ohno Co., Ltd. Electrostatic developing apparatus
US3975243A (en) * 1972-04-07 1976-08-17 Keuffel & Esser Company Electrolytically induced polymerization utilizing diazotization of primary aromatic amines
AT322471B (de) * 1973-07-06 1975-05-26 Voest Ag Bremsvorrichtung für webschützen
US3944421A (en) * 1973-10-03 1976-03-16 Horizons Incorporated, A Division Of Horizons Research Incorporated Process for simultaneous development and etch of photoresist and substrate
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
JPS5629230A (en) * 1979-08-17 1981-03-24 Fuji Photo Film Co Ltd Photosensitive image forming material and image forming method using it
JPS584143A (ja) * 1981-06-30 1983-01-11 Fujitsu Ltd ポジ・レジスト膜の現像方法

Also Published As

Publication number Publication date
EP0073445B1 (de) 1986-06-11
DE3134054A1 (de) 1983-05-05
AU8754382A (en) 1983-03-03
CA1189378A (en) 1985-06-25
JPH0347495B2 (es) 1991-07-19
BR8205025A (pt) 1983-08-09
ZA825879B (en) 1983-06-29
EP0073445A2 (de) 1983-03-09
JPS5842042A (ja) 1983-03-11
FI822965A0 (fi) 1982-08-26
DE3271658D1 (en) 1986-07-17
ATE20394T1 (de) 1986-06-15
US4549944A (en) 1985-10-29
ES8306889A1 (es) 1983-06-01
EP0073445A3 (en) 1983-04-06
FI822965L (fi) 1983-03-01

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