JPS5558523A - Boron diffusing method - Google Patents
Boron diffusing methodInfo
- Publication number
- JPS5558523A JPS5558523A JP13099678A JP13099678A JPS5558523A JP S5558523 A JPS5558523 A JP S5558523A JP 13099678 A JP13099678 A JP 13099678A JP 13099678 A JP13099678 A JP 13099678A JP S5558523 A JPS5558523 A JP S5558523A
- Authority
- JP
- Japan
- Prior art keywords
- atmosphere
- heat treatment
- substrate
- density
- wet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To keep B density produced on the surface of a semiconductor substrate constant when diffusing B in a BSG layer into the substrate by applying a heat treatment first at low temperature in a dry O2 atmosphere and then at high temperature in a wet O2 atmosphere.
CONSTITUTION: A BSG layer is predeposited on the surface of a semiconductor substrate, and a heat treatment is applied at 1,000°C for 15 minutes in a dry O2 atmosphere flowing at 5l/min. Next, the temperature is raised up to 1,100°C in N2 atmosphere and as holding 1,100°C, the heat treatment is applied consecutively for 1 hour in the wet O2 atmosphere at 5l/min. The density becomes 1.2W1.4× 1019/cc from redistributing impurities on the surface of the substrate, the surface density thus sharply decreases from 5.0W6.0×1019/cc which so stands from lacking such a way of treatment, and an uneven distribution is minimized, too.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13099678A JPS5558523A (en) | 1978-10-26 | 1978-10-26 | Boron diffusing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13099678A JPS5558523A (en) | 1978-10-26 | 1978-10-26 | Boron diffusing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5558523A true JPS5558523A (en) | 1980-05-01 |
JPS5751970B2 JPS5751970B2 (en) | 1982-11-05 |
Family
ID=15047492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13099678A Granted JPS5558523A (en) | 1978-10-26 | 1978-10-26 | Boron diffusing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5558523A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2475883C1 (en) * | 2011-09-16 | 2013-02-20 | Федеральное Государственное Унитарное Предприятие "Научно-Производственное Предприятие "Пульсар" | Method for diffusion of boron in silicon |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54102965A (en) * | 1978-01-31 | 1979-08-13 | Nec Home Electronics Ltd | Impurity diffusion method |
-
1978
- 1978-10-26 JP JP13099678A patent/JPS5558523A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54102965A (en) * | 1978-01-31 | 1979-08-13 | Nec Home Electronics Ltd | Impurity diffusion method |
Also Published As
Publication number | Publication date |
---|---|
JPS5751970B2 (en) | 1982-11-05 |
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