JPS5556669A - Semiconductor device and its manufacture - Google Patents
Semiconductor device and its manufactureInfo
- Publication number
- JPS5556669A JPS5556669A JP12962578A JP12962578A JPS5556669A JP S5556669 A JPS5556669 A JP S5556669A JP 12962578 A JP12962578 A JP 12962578A JP 12962578 A JP12962578 A JP 12962578A JP S5556669 A JPS5556669 A JP S5556669A
- Authority
- JP
- Japan
- Prior art keywords
- paste
- substrate
- conductive paste
- whose main
- break
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemically Coating (AREA)
- Electrodes Of Semiconductors (AREA)
- Photovoltaic Devices (AREA)
Abstract
PURPOSE: To facilitate the formation of electrodes by depositing Ni and the like on the main surface of one side of a substrate which has a diffused layer on the main surface of the other side, applying conductive paste whose main components are Ag, Au, and Al on the diffused layer, and applying the conductive paste whose main component is Ag on the Ni side at the same sintering temperature.
CONSTITUTION: A conductive paste 4 whose main components are Ag, Au, and Al are provided on a diffusion layer 2 which forms a pn junction. On an n-type substrate, is deposited Ni which has the same effect to raise the surface-impurity concentration, and is applied a conductive paste 5 whose main component is Ag. The paste 4 is well contacted at temperatures (550∼650°C) lower than before, and the electrode which has low contact resistance and is not subjected to the break through the shallow diffusion layer can be reproduced. The paste 5 is sintered in concurrence with the sintering of the paste 4 and makes ohmic contact with the substrate, generating nickel silicide at the boundary between the substrate and Ni, thereby the resistance is decreased. When the sintering temperature exceeds 650°C, break through occurrs. At the temperature lower than 550°C, the contact resistance is increased, and the transducing efficiency is degraded.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12962578A JPS5556669A (en) | 1978-10-20 | 1978-10-20 | Semiconductor device and its manufacture |
US06/085,205 US4256513A (en) | 1978-10-19 | 1979-10-16 | Photoelectric conversion device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12962578A JPS5556669A (en) | 1978-10-20 | 1978-10-20 | Semiconductor device and its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5556669A true JPS5556669A (en) | 1980-04-25 |
Family
ID=15014100
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12962578A Pending JPS5556669A (en) | 1978-10-19 | 1978-10-20 | Semiconductor device and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5556669A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5967955U (en) * | 1982-10-27 | 1984-05-08 | シャープ株式会社 | solar cell element |
CN102568652A (en) * | 2012-02-28 | 2012-07-11 | 武涛 | Crystalline silicon solar cell electrode paste and preparation method thereof |
WO2017109835A1 (en) * | 2015-12-21 | 2017-06-29 | 三菱電機株式会社 | Solar cell manufacturing method |
-
1978
- 1978-10-20 JP JP12962578A patent/JPS5556669A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5967955U (en) * | 1982-10-27 | 1984-05-08 | シャープ株式会社 | solar cell element |
JPS638150Y2 (en) * | 1982-10-27 | 1988-03-10 | ||
CN102568652A (en) * | 2012-02-28 | 2012-07-11 | 武涛 | Crystalline silicon solar cell electrode paste and preparation method thereof |
WO2017109835A1 (en) * | 2015-12-21 | 2017-06-29 | 三菱電機株式会社 | Solar cell manufacturing method |
JPWO2017109835A1 (en) * | 2015-12-21 | 2018-03-29 | 三菱電機株式会社 | Manufacturing method of solar cell |
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