JPS5552221A - Impurity dispersion method and its device - Google Patents

Impurity dispersion method and its device

Info

Publication number
JPS5552221A
JPS5552221A JP12462578A JP12462578A JPS5552221A JP S5552221 A JPS5552221 A JP S5552221A JP 12462578 A JP12462578 A JP 12462578A JP 12462578 A JP12462578 A JP 12462578A JP S5552221 A JPS5552221 A JP S5552221A
Authority
JP
Japan
Prior art keywords
impurity
base plate
dispersion
radiating
pulse laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12462578A
Other languages
English (en)
Inventor
Katsuo Koike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12462578A priority Critical patent/JPS5552221A/ja
Publication of JPS5552221A publication Critical patent/JPS5552221A/ja
Pending legal-status Critical Current

Links

JP12462578A 1978-10-12 1978-10-12 Impurity dispersion method and its device Pending JPS5552221A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12462578A JPS5552221A (en) 1978-10-12 1978-10-12 Impurity dispersion method and its device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12462578A JPS5552221A (en) 1978-10-12 1978-10-12 Impurity dispersion method and its device

Publications (1)

Publication Number Publication Date
JPS5552221A true JPS5552221A (en) 1980-04-16

Family

ID=14890039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12462578A Pending JPS5552221A (en) 1978-10-12 1978-10-12 Impurity dispersion method and its device

Country Status (1)

Country Link
JP (1) JPS5552221A (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745923A (en) * 1980-09-04 1982-03-16 Seiko Epson Corp Light diffusing method
JPS5750428A (en) * 1980-09-12 1982-03-24 Nec Corp Method and apparatus for manufacturing semiconductor device
JPS60117613A (ja) * 1983-11-30 1985-06-25 Fujitsu Ltd 半導体装置の製造方法
JPS62226671A (ja) * 1986-03-24 1987-10-05 エバラ ソーラー インコーポレイテッド 半導体の接合形成方法
JPS63302518A (ja) * 1987-06-02 1988-12-09 Fujitsu Ltd 半導体装置の製造方法
EP0372092A1 (en) * 1988-06-15 1990-06-13 Kabushiki Kaisha Komatsu Seisakusho Stress conversion device and its production method
US5225367A (en) * 1989-08-17 1993-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electronic device
JPH07211666A (ja) * 1994-01-20 1995-08-11 Yutaka Ishikawa 不純物低温拡散方法及び不純物低温拡散装置
JP2016157911A (ja) * 2015-02-25 2016-09-01 国立大学法人九州大学 不純物導入装置、不純物導入方法及び半導体素子の製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745923A (en) * 1980-09-04 1982-03-16 Seiko Epson Corp Light diffusing method
JPS5750428A (en) * 1980-09-12 1982-03-24 Nec Corp Method and apparatus for manufacturing semiconductor device
JPS60117613A (ja) * 1983-11-30 1985-06-25 Fujitsu Ltd 半導体装置の製造方法
JPS62226671A (ja) * 1986-03-24 1987-10-05 エバラ ソーラー インコーポレイテッド 半導体の接合形成方法
JPS63302518A (ja) * 1987-06-02 1988-12-09 Fujitsu Ltd 半導体装置の製造方法
EP0372092A1 (en) * 1988-06-15 1990-06-13 Kabushiki Kaisha Komatsu Seisakusho Stress conversion device and its production method
US5225367A (en) * 1989-08-17 1993-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing an electronic device
JPH07211666A (ja) * 1994-01-20 1995-08-11 Yutaka Ishikawa 不純物低温拡散方法及び不純物低温拡散装置
JP2016157911A (ja) * 2015-02-25 2016-09-01 国立大学法人九州大学 不純物導入装置、不純物導入方法及び半導体素子の製造方法

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