JPS5544780A - Cleaning device for semiconductor wafer - Google Patents

Cleaning device for semiconductor wafer

Info

Publication number
JPS5544780A
JPS5544780A JP11895878A JP11895878A JPS5544780A JP S5544780 A JPS5544780 A JP S5544780A JP 11895878 A JP11895878 A JP 11895878A JP 11895878 A JP11895878 A JP 11895878A JP S5544780 A JPS5544780 A JP S5544780A
Authority
JP
Japan
Prior art keywords
wafer
entered
solenoid valve
flow
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11895878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS626650B2 (enExample
Inventor
Katsumi Shibasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11895878A priority Critical patent/JPS5544780A/ja
Publication of JPS5544780A publication Critical patent/JPS5544780A/ja
Publication of JPS626650B2 publication Critical patent/JPS626650B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP11895878A 1978-09-27 1978-09-27 Cleaning device for semiconductor wafer Granted JPS5544780A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11895878A JPS5544780A (en) 1978-09-27 1978-09-27 Cleaning device for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11895878A JPS5544780A (en) 1978-09-27 1978-09-27 Cleaning device for semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS5544780A true JPS5544780A (en) 1980-03-29
JPS626650B2 JPS626650B2 (enExample) 1987-02-12

Family

ID=14749478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11895878A Granted JPS5544780A (en) 1978-09-27 1978-09-27 Cleaning device for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5544780A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121893A (ja) * 1982-12-22 1984-07-14 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン マスク・クリ−ニング・システム
JPS59215729A (ja) * 1983-05-21 1984-12-05 Ulvac Corp 半導体もしくは磁気記録媒体等の基板の洗浄装置
JPS60163436A (ja) * 1984-02-06 1985-08-26 Seiichiro Sogo 半導体材料の洗浄乾燥方法
JPS61238383A (ja) * 1985-04-16 1986-10-23 株式会社ミツトヨ 恒温洗浄装置
JPS6287434U (enExample) * 1985-11-21 1987-06-04
JPS6420726U (enExample) * 1987-07-27 1989-02-01
US4960140A (en) * 1984-11-30 1990-10-02 Ishijima Industrial Co., Ltd. Washing arrangement for and method of washing lead frames
US5116250A (en) * 1987-09-18 1992-05-26 Tokyo Ohka Kogyo Co., Ltd. Method and apparatus for applying a coating material to a substrate
WO2014089942A1 (zh) * 2012-12-14 2014-06-19 北京七星华创电子股份有限公司 清洗机摆动喷淋装置及方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0293245A (ja) * 1988-09-28 1990-04-04 Rinnai Corp 併設型給湯器
JPH02219955A (ja) * 1989-02-20 1990-09-03 Toto Ltd ガス給湯機

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5452984A (en) * 1977-10-04 1979-04-25 Nec Corp Semiconductor cleansing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5452984A (en) * 1977-10-04 1979-04-25 Nec Corp Semiconductor cleansing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121893A (ja) * 1982-12-22 1984-07-14 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン マスク・クリ−ニング・システム
JPS59215729A (ja) * 1983-05-21 1984-12-05 Ulvac Corp 半導体もしくは磁気記録媒体等の基板の洗浄装置
JPS60163436A (ja) * 1984-02-06 1985-08-26 Seiichiro Sogo 半導体材料の洗浄乾燥方法
US4960140A (en) * 1984-11-30 1990-10-02 Ishijima Industrial Co., Ltd. Washing arrangement for and method of washing lead frames
JPS61238383A (ja) * 1985-04-16 1986-10-23 株式会社ミツトヨ 恒温洗浄装置
JPS6287434U (enExample) * 1985-11-21 1987-06-04
JPS6420726U (enExample) * 1987-07-27 1989-02-01
US5116250A (en) * 1987-09-18 1992-05-26 Tokyo Ohka Kogyo Co., Ltd. Method and apparatus for applying a coating material to a substrate
WO2014089942A1 (zh) * 2012-12-14 2014-06-19 北京七星华创电子股份有限公司 清洗机摆动喷淋装置及方法

Also Published As

Publication number Publication date
JPS626650B2 (enExample) 1987-02-12

Similar Documents

Publication Publication Date Title
KR100230694B1 (ko) 기판세정처리장치
JPS5544780A (en) Cleaning device for semiconductor wafer
US7021319B2 (en) Assisted rinsing in a single wafer cleaning process
JP3299281B2 (ja) 表面を入念に洗浄するための方法と装置
US4027686A (en) Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
GB2056323A (en) Applying photoresist onto silicon wafers
KR970003643A (ko) 화학적 기계 연마용 린스 스프레이 바아
JPS62150828A (ja) ウエハ乾燥装置
KR19980087206A (ko) 웨이퍼형 물품, 특히 실리콘 웨이퍼의 처리용 장치
DE60031852D1 (de) Verfahren und system zur reinigung eines wafers nach chemisch- mechanischem polieren oder plasmabehandlung
JP2007157930A (ja) ウェーハ洗浄装置
JPS61296724A (ja) 高圧ジエツトスクラバ洗浄装置
US7144459B2 (en) Centrifugal swing arm spray processor
US20020050015A1 (en) Cleaning apparatus for semiconductor wafer
JPS6226175B2 (enExample)
JPS623974B2 (enExample)
JPS61239625A (ja) レジスト塗布装置
JP2558490B2 (ja) 現像装置
JPH0466500B2 (enExample)
JPS6292316A (ja) ホトレジスト塗布装置
JPH07230979A (ja) 乾燥方法及び乾燥装置
CN118039532A (zh) 一种晶圆处理装置
KR0133342B1 (ko) 배기수단이 장착된 기판 세정장치
JPS54159871A (en) Small piece washing method
KR200267225Y1 (ko) 웨이퍼의 현상 및 세척 장치