JPS54159871A - Small piece washing method - Google Patents

Small piece washing method

Info

Publication number
JPS54159871A
JPS54159871A JP6941078A JP6941078A JPS54159871A JP S54159871 A JPS54159871 A JP S54159871A JP 6941078 A JP6941078 A JP 6941078A JP 6941078 A JP6941078 A JP 6941078A JP S54159871 A JPS54159871 A JP S54159871A
Authority
JP
Japan
Prior art keywords
adsorption head
small piece
air
semiconductor wafer
upper face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6941078A
Other languages
Japanese (ja)
Inventor
Tetsuro Tsuji
Masaaki Sadamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6941078A priority Critical patent/JPS54159871A/en
Publication of JPS54159871A publication Critical patent/JPS54159871A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To remove completely water drops of a semiconductor wafer adsorption head by spraying air to the small piece adsorption head simultaneously with rotating the small piece adsorption head until a semiconductor wafer small piece is fixed.
CONSTITUTION: A short time from the supply of semiconductor wafer 2, which should be subjected to washing processing next, to the vacuum adsorption of semiconductor wafer 2 is utilized to spary air from air pipe 8, which has air passing hole 81 for air, N2, etc., onto the upper face of adsorption head 1, which is rotated in a high speed, simultaneously with rotating adsorption head 1 in a high speed of 1000 to 5000rpm. Therefore, water drops 61 and dirt stuck to the upper face of adsorption head 1 are removed completely, and the upper face of adsorption head 1 is always held clear.
COPYRIGHT: (C)1979,JPO&Japio
JP6941078A 1978-06-08 1978-06-08 Small piece washing method Pending JPS54159871A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6941078A JPS54159871A (en) 1978-06-08 1978-06-08 Small piece washing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6941078A JPS54159871A (en) 1978-06-08 1978-06-08 Small piece washing method

Publications (1)

Publication Number Publication Date
JPS54159871A true JPS54159871A (en) 1979-12-18

Family

ID=13401800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6941078A Pending JPS54159871A (en) 1978-06-08 1978-06-08 Small piece washing method

Country Status (1)

Country Link
JP (1) JPS54159871A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59134834A (en) * 1983-01-21 1984-08-02 Mitsubishi Electric Corp Washing device for semiconductor wafer
JPH06159507A (en) * 1992-11-20 1994-06-07 Power Reactor & Nuclear Fuel Dev Corp Bellows

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59134834A (en) * 1983-01-21 1984-08-02 Mitsubishi Electric Corp Washing device for semiconductor wafer
JPH0458179B2 (en) * 1983-01-21 1992-09-16 Mitsubishi Electric Corp
JPH06159507A (en) * 1992-11-20 1994-06-07 Power Reactor & Nuclear Fuel Dev Corp Bellows

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