JPS5527622A - Semiconductor laser manufacturing method - Google Patents
Semiconductor laser manufacturing methodInfo
- Publication number
- JPS5527622A JPS5527622A JP10057178A JP10057178A JPS5527622A JP S5527622 A JPS5527622 A JP S5527622A JP 10057178 A JP10057178 A JP 10057178A JP 10057178 A JP10057178 A JP 10057178A JP S5527622 A JPS5527622 A JP S5527622A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- junction
- molecular beam
- algaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To lower the threshold current of laser oscillation, by making an active layer thin by using the molecular beam epitaxial method, and at the same time, by producing laser oscillation by injecting a carrier through a PN homojunction. CONSTITUTION:By the molecular beam epitaxial method, a molecular beam grown wafer is formed, consisting of N-type AlGaAs layer 10 and 12 which are to become light-sealing layers, N-type GaAs layer 11, which is to become an active layer, and N-type GaAs layer 13, which is to become an ohmic contact layer. Next, by diffusing P-type dopant so that it expands from the surface of the left half of layer 13 to the major part of base 1a, PN GaAs homojunction 19 is formed on the junction of layer 11 and P-type GaAs layer 16. At the same time, PN AlGaAs homojunctions 20 and 21 are formed respectively on the junction of layer 10 and P-type AlGaAs layer 15 and the junction of layer 12 and P-type AlGaAs layer 17. Then, layer 13 and layer 18 are separated, and an electrode is formed for each.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10057178A JPS5527622A (en) | 1978-08-17 | 1978-08-17 | Semiconductor laser manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10057178A JPS5527622A (en) | 1978-08-17 | 1978-08-17 | Semiconductor laser manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5527622A true JPS5527622A (en) | 1980-02-27 |
Family
ID=14277584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10057178A Pending JPS5527622A (en) | 1978-08-17 | 1978-08-17 | Semiconductor laser manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527622A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5073895A (en) * | 1990-04-18 | 1991-12-17 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser |
-
1978
- 1978-08-17 JP JP10057178A patent/JPS5527622A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5073895A (en) * | 1990-04-18 | 1991-12-17 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser |
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