JPS5521515A - Surface treatment - Google Patents

Surface treatment

Info

Publication number
JPS5521515A
JPS5521515A JP9265278A JP9265278A JPS5521515A JP S5521515 A JPS5521515 A JP S5521515A JP 9265278 A JP9265278 A JP 9265278A JP 9265278 A JP9265278 A JP 9265278A JP S5521515 A JPS5521515 A JP S5521515A
Authority
JP
Japan
Prior art keywords
workpiece
anions
anode
glow discharge
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9265278A
Other languages
Japanese (ja)
Other versions
JPS5610379B2 (en
Inventor
Koji Yoshida
Imao Tamura
Koichi Kuwabara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OUYOU KAGAKU KENKYUSHO
OYO KAGAKU KENKYUSHO
Original Assignee
OUYOU KAGAKU KENKYUSHO
OYO KAGAKU KENKYUSHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OUYOU KAGAKU KENKYUSHO, OYO KAGAKU KENKYUSHO filed Critical OUYOU KAGAKU KENKYUSHO
Priority to JP9265278A priority Critical patent/JPS5521515A/en
Publication of JPS5521515A publication Critical patent/JPS5521515A/en
Publication of JPS5610379B2 publication Critical patent/JPS5610379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To perform stable and sure surface treatment by glow discharge, by setting a workpiece as a cathode for the glow discharge, depositing cations on the workpiece and combining anions with an anode to remove anions. CONSTITUTION:The glow discharge is caused between the electrodes 1, 3 while TiCl4 gas is supplied through a feed port 9 and discharged through an exhaust port 7. At that time, a high-frequency current is caused to flow through a coil 10. The cations of Ti are thus produced and bombarded on the steel workpiece 1 which serves as the cathode. As a result, Ti is coated on the steel 1. The anions of Cl reach the anode 3 and react with the anode metal such as Cu, Mg or Sb capable of easily reacting with Cl. The reaction product is removed from the discharge system. Since ionization is effected by a high-frequency power source separate from a DC power source, the treatment conditions are controlled stable and a high surface treatment effect is produced.
JP9265278A 1978-07-31 1978-07-31 Surface treatment Granted JPS5521515A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9265278A JPS5521515A (en) 1978-07-31 1978-07-31 Surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9265278A JPS5521515A (en) 1978-07-31 1978-07-31 Surface treatment

Publications (2)

Publication Number Publication Date
JPS5521515A true JPS5521515A (en) 1980-02-15
JPS5610379B2 JPS5610379B2 (en) 1981-03-07

Family

ID=14060386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9265278A Granted JPS5521515A (en) 1978-07-31 1978-07-31 Surface treatment

Country Status (1)

Country Link
JP (1) JPS5521515A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56130465A (en) * 1980-03-14 1981-10-13 Canon Inc Film forming method
EP0087151A2 (en) * 1982-02-23 1983-08-31 Siemens Aktiengesellschaft Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition
FR2557149A1 (en) * 1983-12-27 1985-06-28 France Etat METHOD AND DEVICE FOR DEPOSITING, ON A SUPPORT, A THIN LAYER OF A MATERIAL FROM A REACTIVE PLASMA
JPS61238962A (en) * 1985-04-16 1986-10-24 Matsushita Electric Ind Co Ltd Method and apparatus for forming film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56130465A (en) * 1980-03-14 1981-10-13 Canon Inc Film forming method
JPS6315348B2 (en) * 1980-03-14 1988-04-04 Canon Kk
EP0087151A2 (en) * 1982-02-23 1983-08-31 Siemens Aktiengesellschaft Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition
EP0087151A3 (en) * 1982-02-23 1984-07-25 Siemens Aktiengesellschaft Process for producing layers of refractory metals or metallic compounds by chemical vapour deposition
FR2557149A1 (en) * 1983-12-27 1985-06-28 France Etat METHOD AND DEVICE FOR DEPOSITING, ON A SUPPORT, A THIN LAYER OF A MATERIAL FROM A REACTIVE PLASMA
EP0149408A2 (en) * 1983-12-27 1985-07-24 ETAT FRANCAIS représenté par le Ministre des PTT (Centre National d'Etudes des Télécommunications) Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma
JPS61238962A (en) * 1985-04-16 1986-10-24 Matsushita Electric Ind Co Ltd Method and apparatus for forming film

Also Published As

Publication number Publication date
JPS5610379B2 (en) 1981-03-07

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