JPS55164831A - Preparation of self-supporting type metallic mask - Google Patents

Preparation of self-supporting type metallic mask

Info

Publication number
JPS55164831A
JPS55164831A JP7123179A JP7123179A JPS55164831A JP S55164831 A JPS55164831 A JP S55164831A JP 7123179 A JP7123179 A JP 7123179A JP 7123179 A JP7123179 A JP 7123179A JP S55164831 A JPS55164831 A JP S55164831A
Authority
JP
Japan
Prior art keywords
film
resist film
resist
metal
self
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7123179A
Other languages
Japanese (ja)
Inventor
Chikaichi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP7123179A priority Critical patent/JPS55164831A/en
Publication of JPS55164831A publication Critical patent/JPS55164831A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prepare the titled mask having high precision micropatterns and yet sufficient strength, by repeating a step of metal plating in the holes of the figure made of a resist film as a protective film. CONSTITUTION:Conductive metal film 22, such as a copper thin film is fabricated on silicon substrate 23, positive type resist film is attached onto film 22, imagewise exposed, and developed to form figure 21 made of the resist film (step 1). Metal 24, such as nickel to be used as a masking material is plated on the exposed parts of film 22 using film 22 as an electrode to form a plate not exceeding the height of figure 21 (step 2). The second resist film is attached to them 21, 24, likewise exposed and developed to form figure 25 made of the resist film (step 4), and plated to form metal film 26 (step 4). Steps 3, 4 are repeated desired times and substrate 23, electrode 22, and resist films 21 and 25 are removed to form self- supporting type metallic mask 27.
JP7123179A 1979-06-08 1979-06-08 Preparation of self-supporting type metallic mask Pending JPS55164831A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7123179A JPS55164831A (en) 1979-06-08 1979-06-08 Preparation of self-supporting type metallic mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7123179A JPS55164831A (en) 1979-06-08 1979-06-08 Preparation of self-supporting type metallic mask

Publications (1)

Publication Number Publication Date
JPS55164831A true JPS55164831A (en) 1980-12-22

Family

ID=13454701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7123179A Pending JPS55164831A (en) 1979-06-08 1979-06-08 Preparation of self-supporting type metallic mask

Country Status (1)

Country Link
JP (1) JPS55164831A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012122119A (en) * 2010-12-10 2012-06-28 Seiko Instruments Inc Method for production of electroformed body

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012122119A (en) * 2010-12-10 2012-06-28 Seiko Instruments Inc Method for production of electroformed body

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