JPS5543818A - Photo-resist mask manufacturing method - Google Patents

Photo-resist mask manufacturing method

Info

Publication number
JPS5543818A
JPS5543818A JP11591178A JP11591178A JPS5543818A JP S5543818 A JPS5543818 A JP S5543818A JP 11591178 A JP11591178 A JP 11591178A JP 11591178 A JP11591178 A JP 11591178A JP S5543818 A JPS5543818 A JP S5543818A
Authority
JP
Japan
Prior art keywords
copper plate
mask pattern
photo
mask
resist mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11591178A
Other languages
Japanese (ja)
Inventor
Isamu Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11591178A priority Critical patent/JPS5543818A/en
Publication of JPS5543818A publication Critical patent/JPS5543818A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable a mask to prolong its service life by plating a metal in a mask pattern and using thus plated film as a mask pattern.
CONSTITUTION: A mask pattern 8 is printed on a copper plate 7, and after an exfoliating agent is coated, electroplating is conducted with the copper plate 7 as an electrode, so that metal contained on a plating liquid is plated into the mask pattern 8 printed on the copper plate 7. And then, the copper plate 7 is taken out, and a plated film 9 is exfoliated form the copper plate and attached onto a glass plate with an adhesive, so that a mask for photo-resist is produced.
COPYRIGHT: (C)1980,JPO&Japio
JP11591178A 1978-09-22 1978-09-22 Photo-resist mask manufacturing method Pending JPS5543818A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11591178A JPS5543818A (en) 1978-09-22 1978-09-22 Photo-resist mask manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11591178A JPS5543818A (en) 1978-09-22 1978-09-22 Photo-resist mask manufacturing method

Publications (1)

Publication Number Publication Date
JPS5543818A true JPS5543818A (en) 1980-03-27

Family

ID=14674254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11591178A Pending JPS5543818A (en) 1978-09-22 1978-09-22 Photo-resist mask manufacturing method

Country Status (1)

Country Link
JP (1) JPS5543818A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199132U (en) * 1986-06-06 1987-12-18

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199132U (en) * 1986-06-06 1987-12-18

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