JPS5516459A - Taper etching method - Google Patents
Taper etching methodInfo
- Publication number
- JPS5516459A JPS5516459A JP8955878A JP8955878A JPS5516459A JP S5516459 A JPS5516459 A JP S5516459A JP 8955878 A JP8955878 A JP 8955878A JP 8955878 A JP8955878 A JP 8955878A JP S5516459 A JPS5516459 A JP S5516459A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- layer
- pattern
- ion beam
- placed beyond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title abstract 5
- 238000000034 method Methods 0.000 title 1
- 238000010884 ion-beam technique Methods 0.000 abstract 3
- 230000001678 irradiating effect Effects 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 125000006850 spacer group Chemical group 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8955878A JPS5516459A (en) | 1978-07-21 | 1978-07-21 | Taper etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8955878A JPS5516459A (en) | 1978-07-21 | 1978-07-21 | Taper etching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5516459A true JPS5516459A (en) | 1980-02-05 |
| JPS63944B2 JPS63944B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-01-09 |
Family
ID=13974141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8955878A Granted JPS5516459A (en) | 1978-07-21 | 1978-07-21 | Taper etching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5516459A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105655231A (zh) * | 2014-11-13 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种刻蚀用掩膜组及应用其的衬底刻蚀方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1007908A3 (nl) * | 1993-12-24 | 1995-11-14 | Philips Electronics Nv | Beeldweergave-inrichting met afbuigeenheid en afbuigeenheid voor een beeldweergave-inrichting. |
-
1978
- 1978-07-21 JP JP8955878A patent/JPS5516459A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105655231A (zh) * | 2014-11-13 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种刻蚀用掩膜组及应用其的衬底刻蚀方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63944B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-01-09 |
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