JPS5516423A - Forming method of thick metal film pattern - Google Patents

Forming method of thick metal film pattern

Info

Publication number
JPS5516423A
JPS5516423A JP8893778A JP8893778A JPS5516423A JP S5516423 A JPS5516423 A JP S5516423A JP 8893778 A JP8893778 A JP 8893778A JP 8893778 A JP8893778 A JP 8893778A JP S5516423 A JPS5516423 A JP S5516423A
Authority
JP
Japan
Prior art keywords
pattern
metal film
film
spacer
thick metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8893778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237530B2 (cg-RX-API-DMAC7.html
Inventor
Toshiki Kadota
Akira Ozawa
Toshiro Ono
Seitaro Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8893778A priority Critical patent/JPS5516423A/ja
Publication of JPS5516423A publication Critical patent/JPS5516423A/ja
Publication of JPS6237530B2 publication Critical patent/JPS6237530B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8893778A 1978-07-22 1978-07-22 Forming method of thick metal film pattern Granted JPS5516423A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8893778A JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8893778A JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Publications (2)

Publication Number Publication Date
JPS5516423A true JPS5516423A (en) 1980-02-05
JPS6237530B2 JPS6237530B2 (cg-RX-API-DMAC7.html) 1987-08-13

Family

ID=13956791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8893778A Granted JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Country Status (1)

Country Link
JP (1) JPS5516423A (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
JPS62282445A (ja) * 1986-02-18 1987-12-08 Hoya Corp 検査用基板とその製造方法
JPS63155618A (ja) * 1986-12-19 1988-06-28 Hitachi Ltd Ｘ線露光用マスクの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4991771A (cg-RX-API-DMAC7.html) * 1972-12-31 1974-09-02
JPS50132872A (cg-RX-API-DMAC7.html) * 1974-04-06 1975-10-21

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4991771A (cg-RX-API-DMAC7.html) * 1972-12-31 1974-09-02
JPS50132872A (cg-RX-API-DMAC7.html) * 1974-04-06 1975-10-21

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198461A (en) * 1981-05-18 1982-12-06 Philips Nv Radiant lithographic mask and manufacture thereof
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
JPS62282445A (ja) * 1986-02-18 1987-12-08 Hoya Corp 検査用基板とその製造方法
JPS63155618A (ja) * 1986-12-19 1988-06-28 Hitachi Ltd Ｘ線露光用マスクの製造方法

Also Published As

Publication number Publication date
JPS6237530B2 (cg-RX-API-DMAC7.html) 1987-08-13

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