JPS55163840A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS55163840A
JPS55163840A JP7099179A JP7099179A JPS55163840A JP S55163840 A JPS55163840 A JP S55163840A JP 7099179 A JP7099179 A JP 7099179A JP 7099179 A JP7099179 A JP 7099179A JP S55163840 A JPS55163840 A JP S55163840A
Authority
JP
Japan
Prior art keywords
electron beam
electron
aperture plate
exposure device
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7099179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6150374B2 (enrdf_load_stackoverflow
Inventor
Yushi Inagaki
Masahiro Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7099179A priority Critical patent/JPS55163840A/ja
Publication of JPS55163840A publication Critical patent/JPS55163840A/ja
Publication of JPS6150374B2 publication Critical patent/JPS6150374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
JP7099179A 1979-06-06 1979-06-06 Electron beam exposure device Granted JPS55163840A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7099179A JPS55163840A (en) 1979-06-06 1979-06-06 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7099179A JPS55163840A (en) 1979-06-06 1979-06-06 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS55163840A true JPS55163840A (en) 1980-12-20
JPS6150374B2 JPS6150374B2 (enrdf_load_stackoverflow) 1986-11-04

Family

ID=13447510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7099179A Granted JPS55163840A (en) 1979-06-06 1979-06-06 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS55163840A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000004382A (ko) * 1998-06-30 2000-01-25 김영환 샷 패턴 형성방법
JP2008004573A (ja) * 2006-06-20 2008-01-10 Jeol Ltd 荷電粒子ビーム描画方法および装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130679U (enrdf_load_stackoverflow) * 1976-03-31 1977-10-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130679U (enrdf_load_stackoverflow) * 1976-03-31 1977-10-04

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000004382A (ko) * 1998-06-30 2000-01-25 김영환 샷 패턴 형성방법
JP2008004573A (ja) * 2006-06-20 2008-01-10 Jeol Ltd 荷電粒子ビーム描画方法および装置

Also Published As

Publication number Publication date
JPS6150374B2 (enrdf_load_stackoverflow) 1986-11-04

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