JPS52130679U - - Google Patents

Info

Publication number
JPS52130679U
JPS52130679U JP3899976U JP3899976U JPS52130679U JP S52130679 U JPS52130679 U JP S52130679U JP 3899976 U JP3899976 U JP 3899976U JP 3899976 U JP3899976 U JP 3899976U JP S52130679 U JPS52130679 U JP S52130679U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3899976U
Other languages
Japanese (ja)
Other versions
JPS5612837Y2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1976038999U priority Critical patent/JPS5612837Y2/ja
Publication of JPS52130679U publication Critical patent/JPS52130679U/ja
Application granted granted Critical
Publication of JPS5612837Y2 publication Critical patent/JPS5612837Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP1976038999U 1976-03-31 1976-03-31 Expired JPS5612837Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1976038999U JPS5612837Y2 (enrdf_load_stackoverflow) 1976-03-31 1976-03-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1976038999U JPS5612837Y2 (enrdf_load_stackoverflow) 1976-03-31 1976-03-31

Publications (2)

Publication Number Publication Date
JPS52130679U true JPS52130679U (enrdf_load_stackoverflow) 1977-10-04
JPS5612837Y2 JPS5612837Y2 (enrdf_load_stackoverflow) 1981-03-25

Family

ID=28498170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1976038999U Expired JPS5612837Y2 (enrdf_load_stackoverflow) 1976-03-31 1976-03-31

Country Status (1)

Country Link
JP (1) JPS5612837Y2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5471992A (en) * 1977-11-18 1979-06-08 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam shaping aperture mask
JPS55163840A (en) * 1979-06-06 1980-12-20 Fujitsu Ltd Electron beam exposure device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5084176A (enrdf_load_stackoverflow) * 1973-11-26 1975-07-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5084176A (enrdf_load_stackoverflow) * 1973-11-26 1975-07-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5471992A (en) * 1977-11-18 1979-06-08 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam shaping aperture mask
JPS55163840A (en) * 1979-06-06 1980-12-20 Fujitsu Ltd Electron beam exposure device

Also Published As

Publication number Publication date
JPS5612837Y2 (enrdf_load_stackoverflow) 1981-03-25

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