JPS55162227A - Microprojection exposure device - Google Patents

Microprojection exposure device

Info

Publication number
JPS55162227A
JPS55162227A JP6897179A JP6897179A JPS55162227A JP S55162227 A JPS55162227 A JP S55162227A JP 6897179 A JP6897179 A JP 6897179A JP 6897179 A JP6897179 A JP 6897179A JP S55162227 A JPS55162227 A JP S55162227A
Authority
JP
Japan
Prior art keywords
wafer
slit
alignment pattern
optical system
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6897179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5748853B2 (https=
Inventor
Shinji Kuniyoshi
Akihiro Takanashi
Toshishige Kurosaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6897179A priority Critical patent/JPS55162227A/ja
Priority to EP80103125A priority patent/EP0019941B1/en
Priority to DE8080103125T priority patent/DE3071137D1/de
Publication of JPS55162227A publication Critical patent/JPS55162227A/ja
Publication of JPS5748853B2 publication Critical patent/JPS5748853B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP6897179A 1979-06-04 1979-06-04 Microprojection exposure device Granted JPS55162227A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6897179A JPS55162227A (en) 1979-06-04 1979-06-04 Microprojection exposure device
EP80103125A EP0019941B1 (en) 1979-06-04 1980-06-04 Reduction projection aligner system
DE8080103125T DE3071137D1 (en) 1979-06-04 1980-06-04 Reduction projection aligner system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6897179A JPS55162227A (en) 1979-06-04 1979-06-04 Microprojection exposure device

Publications (2)

Publication Number Publication Date
JPS55162227A true JPS55162227A (en) 1980-12-17
JPS5748853B2 JPS5748853B2 (https=) 1982-10-19

Family

ID=13389057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6897179A Granted JPS55162227A (en) 1979-06-04 1979-06-04 Microprojection exposure device

Country Status (3)

Country Link
EP (1) EP0019941B1 (https=)
JP (1) JPS55162227A (https=)
DE (1) DE3071137D1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPH07183213A (ja) * 1994-09-30 1995-07-21 Hitachi Ltd 投影露光方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS58193547A (ja) * 1982-05-07 1983-11-11 Hitachi Ltd 縮小投影露光装置
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
FR2566217B1 (fr) * 1984-05-28 1988-05-27 Micro Controle Procede et dispositif pour la reconnaissance d'un motif particulier d'une image

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPH07183213A (ja) * 1994-09-30 1995-07-21 Hitachi Ltd 投影露光方法

Also Published As

Publication number Publication date
EP0019941B1 (en) 1985-10-02
DE3071137D1 (en) 1985-11-07
JPS5748853B2 (https=) 1982-10-19
EP0019941A1 (en) 1980-12-10

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