DE3071137D1 - Reduction projection aligner system - Google Patents

Reduction projection aligner system

Info

Publication number
DE3071137D1
DE3071137D1 DE8080103125T DE3071137T DE3071137D1 DE 3071137 D1 DE3071137 D1 DE 3071137D1 DE 8080103125 T DE8080103125 T DE 8080103125T DE 3071137 T DE3071137 T DE 3071137T DE 3071137 D1 DE3071137 D1 DE 3071137D1
Authority
DE
Germany
Prior art keywords
reduction projection
projection aligner
aligner system
reduction
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080103125T
Other languages
German (de)
English (en)
Inventor
Shinji Kuniyoshi
Akihiro Takanashi
Toshiei Kurosaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3071137D1 publication Critical patent/DE3071137D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE8080103125T 1979-06-04 1980-06-04 Reduction projection aligner system Expired DE3071137D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6897179A JPS55162227A (en) 1979-06-04 1979-06-04 Microprojection exposure device

Publications (1)

Publication Number Publication Date
DE3071137D1 true DE3071137D1 (en) 1985-11-07

Family

ID=13389057

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080103125T Expired DE3071137D1 (en) 1979-06-04 1980-06-04 Reduction projection aligner system

Country Status (3)

Country Link
EP (1) EP0019941B1 (https=)
JP (1) JPS55162227A (https=)
DE (1) DE3071137D1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS58193547A (ja) * 1982-05-07 1983-11-11 Hitachi Ltd 縮小投影露光装置
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
FR2566217B1 (fr) * 1984-05-28 1988-05-27 Micro Controle Procede et dispositif pour la reconnaissance d'un motif particulier d'une image
JP2675528B2 (ja) * 1994-09-30 1997-11-12 株式会社日立製作所 投影露光方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus

Also Published As

Publication number Publication date
EP0019941B1 (en) 1985-10-02
JPS5748853B2 (https=) 1982-10-19
JPS55162227A (en) 1980-12-17
EP0019941A1 (en) 1980-12-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANWAELTE, 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee