JPS55154537A - Method and apparatus for carrying molten metal - Google Patents

Method and apparatus for carrying molten metal

Info

Publication number
JPS55154537A
JPS55154537A JP6049579A JP6049579A JPS55154537A JP S55154537 A JPS55154537 A JP S55154537A JP 6049579 A JP6049579 A JP 6049579A JP 6049579 A JP6049579 A JP 6049579A JP S55154537 A JPS55154537 A JP S55154537A
Authority
JP
Japan
Prior art keywords
metal
container
molten
vacuum
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6049579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6137336B2 (enExample
Inventor
Yoshikiyo Nakagawa
Tetsuyoshi Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP6049579A priority Critical patent/JPS55154537A/ja
Publication of JPS55154537A publication Critical patent/JPS55154537A/ja
Publication of JPS6137336B2 publication Critical patent/JPS6137336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Jet Pumps And Other Pumps (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Treatment Of Steel In Its Molten State (AREA)
  • Physical Vapour Deposition (AREA)
JP6049579A 1979-05-18 1979-05-18 Method and apparatus for carrying molten metal Granted JPS55154537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6049579A JPS55154537A (en) 1979-05-18 1979-05-18 Method and apparatus for carrying molten metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6049579A JPS55154537A (en) 1979-05-18 1979-05-18 Method and apparatus for carrying molten metal

Publications (2)

Publication Number Publication Date
JPS55154537A true JPS55154537A (en) 1980-12-02
JPS6137336B2 JPS6137336B2 (enExample) 1986-08-23

Family

ID=13143926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6049579A Granted JPS55154537A (en) 1979-05-18 1979-05-18 Method and apparatus for carrying molten metal

Country Status (1)

Country Link
JP (1) JPS55154537A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1357200A1 (en) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermal PVD apparatus with detachable vapor source(s)
WO2014098489A1 (ko) 2012-12-21 2014-06-26 주식회사 포스코 가열 장치 및 이를 포함하는 코팅 기구
WO2015093649A1 (ko) 2013-12-19 2015-06-25 주식회사 포스코 가열장치 및 이를 포함하는 코팅기구
JP2015519469A (ja) * 2012-03-30 2015-07-09 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 液体金属を蒸発器に供給する方法および装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys
JP4747802B2 (ja) * 2005-11-25 2011-08-17 大日本印刷株式会社 真空成膜方法、及び真空成膜装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1357200A1 (en) * 2002-04-25 2003-10-29 Eastman Kodak Company Thermal PVD apparatus with detachable vapor source(s)
JP2015519469A (ja) * 2012-03-30 2015-07-09 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 液体金属を蒸発器に供給する方法および装置
WO2014098489A1 (ko) 2012-12-21 2014-06-26 주식회사 포스코 가열 장치 및 이를 포함하는 코팅 기구
US10196736B2 (en) 2012-12-21 2019-02-05 Posco Heating apparatus, and coating device comprising same
WO2015093649A1 (ko) 2013-12-19 2015-06-25 주식회사 포스코 가열장치 및 이를 포함하는 코팅기구

Also Published As

Publication number Publication date
JPS6137336B2 (enExample) 1986-08-23

Similar Documents

Publication Publication Date Title
JPS5730341A (en) Substrate processing device
JPS55154537A (en) Method and apparatus for carrying molten metal
JPS6417857A (en) Cleaning gas containing chlorine fluoride
JPS63219559A (ja) ドロス除去装置
JPS55157301A (en) Collecting method and apparatus of ineffective metal vapor
GB732891A (en) Improvements in and relating to the production of thin layers of chemical compounds on surfaces
JPS5573866A (en) Continuous vacuum deposition apparatus
JPS59177368A (ja) 真空蒸着装置
JPS62103351A (ja) 連続溶融金属めつき方法
JPS56152737A (en) Chemical vapor deposition device using decreased pressure
CA2332900A1 (en) Apparatus and method for producing plane-parallel flakes
JPS6421059A (en) Production of plated sheet vapor-deposited with metal
JPS57135836A (en) Glow discharge treatment
JPS54149314A (en) Method and apparatus for dh vacuum degassing molten steel
JPH0617560B2 (ja) 金属帯の表面処理におけるガスワイピングノズル
JPS62202070A (ja) 溶融メツキ金属の介在物除去方法
JPS5549104A (en) Liquid metal vapor removing apparatus
JPS5638436A (en) Vacuum degassing equipment
JPS5767174A (en) Plasma etching device
JPS57140608A (en) Gas separation film
JPS57145053A (en) Apparatus for manufacturing long glass strip having metal oxide covering layer
Ordines et al. An Apparatus for the Deposition of Aluminum by the Ionic Route:" Ivadizer"(Ion Vapor Deposition)
US910405A (en) Process and apparatus for producing compound metal objects.
JPS56105475A (en) Coating apparatus and method of substrate by cathode spattering and use
JPS55122900A (en) Electrolytic pickling method for stainless steel strip