JPS55153358A - Manufacturing method of resin sealed semiconductor device - Google Patents

Manufacturing method of resin sealed semiconductor device

Info

Publication number
JPS55153358A
JPS55153358A JP6037979A JP6037979A JPS55153358A JP S55153358 A JPS55153358 A JP S55153358A JP 6037979 A JP6037979 A JP 6037979A JP 6037979 A JP6037979 A JP 6037979A JP S55153358 A JPS55153358 A JP S55153358A
Authority
JP
Japan
Prior art keywords
metathetic
tetra
epoxy resin
borate
silane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6037979A
Other languages
Japanese (ja)
Other versions
JPS5942984B2 (en
Inventor
Masahiro Kitamura
Hiroshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6037979A priority Critical patent/JPS5942984B2/en
Publication of JPS55153358A publication Critical patent/JPS55153358A/en
Publication of JPS5942984B2 publication Critical patent/JPS5942984B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To heighten the dampproof property by using a specific epoxy resin, a phenol novolak resin and a tetra metathetic phosphonium/tetra metathetic borate or the like as the epoxy resin component substance for semiconductor sealing, and also by specifying coupling agents to be added. CONSTITUTION:As the epoxy resin component substances to be used for moulding and hardening a semiconductor device, the following component substances are used. They are, as an epoxy resin, a cresol novolak type epoxy resin with more then two oxirane rings in a molecule is used and as a hardener, a phenol novolak type resin with more than two hydroxyl radicals in a molecule, a tetra metathetic phosphonium/tetra metathetic borate, a tetra metathetic ammonium/tetra metathetic borate or the like and chemical compounds of various imidazole kinds are used. Further, as a silane coupling agent, the mixture of epoxy silane of a ratio 1 and mercaptan silane of a ratio 0.01-1 is used.
JP6037979A 1979-05-18 1979-05-18 Manufacturing method for resin-sealed semiconductor devices Expired JPS5942984B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6037979A JPS5942984B2 (en) 1979-05-18 1979-05-18 Manufacturing method for resin-sealed semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6037979A JPS5942984B2 (en) 1979-05-18 1979-05-18 Manufacturing method for resin-sealed semiconductor devices

Publications (2)

Publication Number Publication Date
JPS55153358A true JPS55153358A (en) 1980-11-29
JPS5942984B2 JPS5942984B2 (en) 1984-10-18

Family

ID=13140439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6037979A Expired JPS5942984B2 (en) 1979-05-18 1979-05-18 Manufacturing method for resin-sealed semiconductor devices

Country Status (1)

Country Link
JP (1) JPS5942984B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204954A (en) * 1985-03-08 1986-09-11 Hitachi Ltd Resin sealed type semiconductor device
WO2020080115A1 (en) * 2018-10-15 2020-04-23 パナソニックIpマネジメント株式会社 Sealing resin composition and semiconductor package

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204954A (en) * 1985-03-08 1986-09-11 Hitachi Ltd Resin sealed type semiconductor device
JPH0576490B2 (en) * 1985-03-08 1993-10-22 Hitachi Ltd
WO2020080115A1 (en) * 2018-10-15 2020-04-23 パナソニックIpマネジメント株式会社 Sealing resin composition and semiconductor package
JP2020063338A (en) * 2018-10-15 2020-04-23 パナソニックIpマネジメント株式会社 Resin composition for encapsulation and semiconductor package

Also Published As

Publication number Publication date
JPS5942984B2 (en) 1984-10-18

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