JPS55152167A - Supplying zinc ion into plating bath - Google Patents

Supplying zinc ion into plating bath

Info

Publication number
JPS55152167A
JPS55152167A JP6069779A JP6069779A JPS55152167A JP S55152167 A JPS55152167 A JP S55152167A JP 6069779 A JP6069779 A JP 6069779A JP 6069779 A JP6069779 A JP 6069779A JP S55152167 A JPS55152167 A JP S55152167A
Authority
JP
Japan
Prior art keywords
zinc
plating bath
epsilon
zinc ion
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6069779A
Other languages
Japanese (ja)
Other versions
JPS582596B2 (en
Inventor
Yoshikazu Yamamichi
Seiichi Kuno
Shigeru Ooyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP54060697A priority Critical patent/JPS582596B2/en
Publication of JPS55152167A publication Critical patent/JPS55152167A/en
Publication of JPS582596B2 publication Critical patent/JPS582596B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/06—Zinc or cadmium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrochemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE:To greatly simplify the work control through facilitated zinc ion replenishment, by a method wherein crystalline epsilon-Zn(OH)2 is added to a zinc plating bath. CONSTITUTION:To replenish zinc ions to a zinc plating bath, epsilon-Zn(OH)2 which is easily soluble at a low temperature and has a good crystallinity is added. This allows a zinc concentration to be properly maintained in the zinc bath. epsilon-Zn(OH)2 having good crystallinity can be precipitated, under a special condition, from an aqueous zinc solution by an alkaline neutralizing agent, and is different from conventional Zn(OH)2 which is particles hard to filter, in that it is not deposited with cations such as Na<+> and NH4<+> or anions such as SO4<2-> and Cl<->, is highly pure, and easily soluble in alkalis.
JP54060697A 1979-05-17 1979-05-17 How to supply zinc ions to the plating bath Expired JPS582596B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54060697A JPS582596B2 (en) 1979-05-17 1979-05-17 How to supply zinc ions to the plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54060697A JPS582596B2 (en) 1979-05-17 1979-05-17 How to supply zinc ions to the plating bath

Publications (2)

Publication Number Publication Date
JPS55152167A true JPS55152167A (en) 1980-11-27
JPS582596B2 JPS582596B2 (en) 1983-01-17

Family

ID=13149738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54060697A Expired JPS582596B2 (en) 1979-05-17 1979-05-17 How to supply zinc ions to the plating bath

Country Status (1)

Country Link
JP (1) JPS582596B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5085531A (en) * 1973-12-04 1975-07-10
JPS52119432A (en) * 1976-03-31 1977-10-06 Sumitomo Metal Ind Continuous electrogalvanizing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5085531A (en) * 1973-12-04 1975-07-10
JPS52119432A (en) * 1976-03-31 1977-10-06 Sumitomo Metal Ind Continuous electrogalvanizing method

Also Published As

Publication number Publication date
JPS582596B2 (en) 1983-01-17

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