JPS55150265A - Flat type diode with pressing force strengthening mechanism - Google Patents
Flat type diode with pressing force strengthening mechanismInfo
- Publication number
- JPS55150265A JPS55150265A JP5690879A JP5690879A JPS55150265A JP S55150265 A JPS55150265 A JP S55150265A JP 5690879 A JP5690879 A JP 5690879A JP 5690879 A JP5690879 A JP 5690879A JP S55150265 A JPS55150265 A JP S55150265A
- Authority
- JP
- Japan
- Prior art keywords
- pressing force
- diode
- regions
- force strengthening
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/07—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
- H01L25/072—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
Abstract
PURPOSE:To uniformly press both an effective region for rectifying and a pressing force strengthening area formed with an insulating film for not rectifying by isolating one diode wafer to form both the regions and containing them in a flat seal. CONSTITUTION:An SiO2 film 11 is formed on the n<+>-type layer of an pnn<+>silicon wafer 10, Au is diffused in the p-type layer, and then W reinforcing electrode 14 is secured via solder 13 containing mainly aluminum. An opening A' is perforated at the film 11, and an aluminum electrode 12 is selectively formed with regions A and B. The regions C, D are sandblasted to be isolated, and surface stabilizing treatment is chemically executed at the exposed junction portion, and a protective film 15 is coated thereon. The region B becomes an insulated pressing force strengthening area. According to this configuration, a flat type SCR and a diode can be, for example, connected in anti-parallel manner and both elements can be simultaneously pressed in parallel. Therefore, it can reduce the floating inductance and since it can freely select the capacity of the diode, it can improve the utility of the SCR.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5690879A JPS55150265A (en) | 1979-05-11 | 1979-05-11 | Flat type diode with pressing force strengthening mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5690879A JPS55150265A (en) | 1979-05-11 | 1979-05-11 | Flat type diode with pressing force strengthening mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55150265A true JPS55150265A (en) | 1980-11-22 |
JPS5731304B2 JPS5731304B2 (en) | 1982-07-03 |
Family
ID=13040546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5690879A Granted JPS55150265A (en) | 1979-05-11 | 1979-05-11 | Flat type diode with pressing force strengthening mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55150265A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168256A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Semiconductor device |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62206105A (en) * | 1986-03-07 | 1987-09-10 | 日本地下水開発株式会社 | Water non-scattering snow removing method |
JPS62206104A (en) * | 1986-03-07 | 1987-09-10 | 日本地下水開発株式会社 | Water non-scattering snow removing method |
JPH04237703A (en) * | 1991-01-16 | 1992-08-26 | Nippon Chikasui Kaihatsu Corp Ltd | Constructing method for snow melting facility with no sprinkling |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5049980A (en) * | 1973-09-03 | 1975-05-06 |
-
1979
- 1979-05-11 JP JP5690879A patent/JPS55150265A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5049980A (en) * | 1973-09-03 | 1975-05-06 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58168256A (en) * | 1982-03-30 | 1983-10-04 | Fujitsu Ltd | Semiconductor device |
JPH0336303B2 (en) * | 1982-03-30 | 1991-05-31 | Fujitsu Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS5731304B2 (en) | 1982-07-03 |
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